Effect of ion implantation layer on adhesion of DLC film by plasma-based ion implantation and deposition

被引：16
|
作者：
Oka, Y.
Nishijima, M.
Hiraga, K.
Yatsuzuka, M.
机构：
[1] Univ Hyogo, Grad Sch Engn, Himeji, Hyogo 6712201, Japan
[2] Tohoku Univ, Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan
来源：
SURFACE & COATINGS TECHNOLOGY | 2007年 / 201卷 / 15期
关键词：
DLC; PBIID; adhesive strength; STEM; EDS;
D O I：
10.1016/j.surfcoat.2006.09.027
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
High adhesive diamond-like carbon (DLC) film on SUS304 was obtained using carbon ion implantation between DLC film and substrate material by plasma-based ion implantation and deposition (PBIID). Implantation of mixed silicon and carbon ions to the substrate resulted in much higher adhesion strength than that of the epoxy resin. Effect of ion implantation on adhesion of DLC film was studied by cross sectional STEM observation and EDS element analysis. Enhancement in adhesive strength by ion implantation of mixed carbon and silicon was ascribed to the formation of the multilayer interface consisting of mixed carbon and silicon ion implanted layer and the amorphous layer of carbon and silicon. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码：6647 / 6650
页数：4
相关论文
共 50 条
  • [1] Effect of ion beam implantation on density of DLC prepared by plasma-based ion implantation and deposition
    Oka, Y
    Kirinuki, A
    Suzuki, T
    Yatsuzuka, A
    Yatsui, K
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2006, 242 (1-2): : 335 - 337
  • [2] Reduction of pinhole defects in DLC film prepared with plasma-based ion implantation and deposition
    Nishino, Wataru
    Uchida, Hitoshi
    Yatsuzuka, Mitsuyasu
    [J]. TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 2007, 32 (04): : 887 - 890
  • [3] Enhancement of adhesive strength of DLC film by plasma-based ion implantation
    Kirinuki, M
    Tomita, A
    Kusuda, M
    Oka, Y
    Murakami, A
    Yatsuzuka, M
    [J]. NEW FRONTIERS OF PROCESSING AND ENGINEERING IN ADVANCED MATERIALS, 2005, 502 : 315 - 320
  • [4] Multi-dipolar plasmas for plasma-based ion implantation and plasma-based ion implantation and deposition
    Béchu, S
    Maulat, O
    Arnal, Y
    Vempaire, D
    Lacoste, A
    Pelletier, J
    [J]. SURFACE & COATINGS TECHNOLOGY, 2004, 186 (1-2): : 170 - 176
  • [5] Microstructure of interface for high-adhesion DLC film on metal substrates by plasma-based ion implantation
    Yatsuzuka, Mitsuyasu
    Oka, Yoshihiro
    Nishijima, Masahiko
    Hiraga, Kenji
    [J]. VACUUM, 2008, 83 (01) : 190 - 197
  • [6] Evaluation of pinhole defect in DLC film prepared by hybrid process of plasma-based ion implantation and deposition
    Yatsuzuka, Mitsuyasu
    Tateiwa, Junichi
    Uchida, Hitoshi
    [J]. VACUUM, 2006, 80 (11-12) : 1351 - 1355
  • [7] Properties of SiCx film prepared with plasma-based ion implantation and deposition
    Utsumi, Takayuki
    Oka, Yoshihiro
    Suzuki, Tsuneo
    Jiang, Weihua
    Yatsuzuka, Mitsuyasu
    [J]. TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 2007, 32 (04): : 879 - 882
  • [8] Measurement of residual stress in DLC films prepared by plasma-based ion implantation and deposition
    Oka, Y
    Kirinuki, M
    Nishimura, Y
    Azuma, K
    Fujiwara, E
    Yatsuzuka, M
    [J]. SURFACE & COATINGS TECHNOLOGY, 2004, 186 (1-2): : 141 - 145
  • [9] Plasma-based ion implantation
    Möller, W
    Mukherjee, S
    [J]. CURRENT SCIENCE, 2002, 83 (03): : 237 - 253
  • [10] Coating and ion implantation to the inner surface of a pipe by metal plasma-based ion implantation and deposition
    Yukimura, K
    Kuze, E
    Kumagai, M
    Kohata, M
    Numata, K
    Saito, H
    Maruyama, T
    Ma, XX
    [J]. SURFACE & COATINGS TECHNOLOGY, 2003, 169 : 411 - 414
12345