A Flexible Amorphous Bi5Nb3O15 Film for the Gate Insulator of the Low-Voltage Operating Pentacene Thin-Film Transistor Fabricated at Room Temperature

被引:5
|
作者
Cho, Kyung-Hoon [1 ]
Seong, Tae-Geun [1 ]
Choi, Joo-Young [1 ]
Kim, Jin-Seong [1 ]
Kwon, Jae-Hong [2 ]
Shing, Sang-Il [2 ]
Chung, Myung-Ho [2 ]
Ju, Byeong-Kwon [2 ]
Nahm, Sahn [1 ]
机构
[1] Korea Univ, Dept Mat Sci & Engn, Seoul 136713, South Korea
[2] Korea Univ, Display & Nanosyst Lab, Coll Engn, Seoul 136713, South Korea
关键词
FIELD-EFFECT TRANSISTORS; ELECTRICAL-PROPERTIES; ORGANIC TRANSISTORS; MIM CAPACITORS; DIELECTRICS; CIRCUITS; MOBILITY; LAYER;
D O I
10.1021/la9016504
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The amorphous Bi5Nb3O15 film grown at room temperature under all oxygen-plasma sputtering ambient (BNRT-O-2 film) has a hydrophobic surface with a surface energy of 35.6 mJ m(-2), which is close to that of the orthorhombic pentacene (38 mJ m(-2)), resulting in the formation of a good pentacene layer without the introduction of all additional polymer layer. This film was very flexible, maintaining a high capacitance of 145 nF cm(-2) during and after 10(5) bending cycles with a small curvature radius of 7.5 mill. This film was optically transparent. Furthermore, the flexible, pentacene-based, organic thin-film transistors (OTFTs) fabricated oil the poly(ether sulfone) substrate at room temperature using a BNRT-O-2 film as a gate insulator exhibited a promising device performance with a high field effect mobility of 0.5 cm(2) V-1 s(-1), an on/off current modulation of 10(5), and a small subthreshold slope of 0.2 V decade(-1) under a low operating voltage of -5 V. This device also maintained a high carrier mobility of 0.45 cm(2) V-1 s(-1) during the bending with a small curvature radius of 9 mm. Therefore, the BNRT-O-2 film is considered a promising material for the gate insulator of the flexible, pentacene-based OTFT.
引用
收藏
页码:12349 / 12354
页数:6
相关论文
共 50 条
  • [21] Influence of the oxygen concentration of YSZ gate dielectric layer on the low voltage operating pentacene thin film transistor
    Kim, CS
    Kim, WJ
    Jo, SJ
    Lee, SW
    Lee, SJ
    Baik, HK
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2006, 9 (03) : G96 - G99
  • [22] Solution processed hafnium oxide as a gate insulator for low-voltage oxide thin-film transistors
    Avis, Christophe
    Kim, Youn Goo
    Jang, Jin
    JOURNAL OF MATERIALS CHEMISTRY, 2012, 22 (34) : 17415 - 17420
  • [23] Polyimide/polyvinyl alcohol bilayer gate insulator for low-voltage organic thin-film transistors
    Yoo, Sungmi
    Kim, Yun Ho
    Ka, Jae-Won
    Kim, Yong Seok
    Yi, Mi Hye
    Jang, Kwang-Suk
    ORGANIC ELECTRONICS, 2015, 23 : 213 - 218
  • [24] Low-voltage pentacene thin-film transistors using Hf-based blend gate dielectrics
    Oh, Jeong-Do
    Kim, Dae-Kyu
    Kim, Jang-Woon
    Ha, Young-Geun
    Choi, Jong-Ho
    JOURNAL OF MATERIALS CHEMISTRY C, 2016, 4 (04) : 807 - 814
  • [25] Air stable, high performance pentacene thin-film transistor fabricated on SiO2 gate insulator treated with β-phenethyltrichlorosilane
    Kumaki, Daisuke
    Yahiro, Masayuki
    Inoue, Youji
    Tokito, Shizuo
    APPLIED PHYSICS LETTERS, 2007, 90 (13)
  • [26] Fully Room-Temperature-Fabricated Low-Voltage Operating Pentacene-Based Organic Field-Effect Transistors With HfON Gate Insulator
    Liao, Min
    Ishiwara, Hiroshi
    Ohmi, Shun-ichiro
    IEEE ELECTRON DEVICE LETTERS, 2011, 32 (11) : 1600 - 1602
  • [27] Hybrid flexible ambipolar thin-film transistors based on pentacene and ZnO capable of low-voltage operation
    Yang, Chanwoo
    Yoo, Eun Joo
    Lee, Seung Woo
    An, Tae Kyu
    Kim, Se Hyun
    CHINESE JOURNAL OF PHYSICS, 2016, 54 (04) : 471 - 474
  • [28] Novel Chemical Route to Prepare a New Polymer Blend Gate Dielectric for Flexible Low-Voltage Organic Thin-Film Transistor
    Meena, Jagan Singh
    Chu, Min-Ching
    Chang, Yu-Cheng
    Wu, Chung-Shu
    Cheng, Chih-Chia
    Chang, Feng-Chih
    Ko, Fu-Hsiang
    ACS APPLIED MATERIALS & INTERFACES, 2012, 4 (06) : 3261 - 3269
  • [29] Low-voltage InGaZnO thin-film transistors with Al2O3 gate insulator grown by atomic layer deposition
    Kim, J. B.
    Fuentes-Hernandez, C.
    Potscavage, W. J., Jr.
    Zhang, X. -H.
    Kippelen, B.
    APPLIED PHYSICS LETTERS, 2009, 94 (14)
  • [30] Fabrication of Amorphous InGaZnO Thin-Film Transistor with Solution Processed SrZrO3 Gate Insulator
    Takahashi, Takanori
    Oikawa, Kento
    Hoga, Takeshi
    Uraoka, Yukiharu
    Uchiyama, Kiyoshi
    PROCEEDINGS OF THE INTERNATIONAL CONFERENCE OF GLOBAL NETWORK FOR INNOVATIVE TECHNOLOGY AND AWAM INTERNATIONAL CONFERENCE IN CIVIL ENGINEERING (IGNITE-AICCE'17): SUSTAINABLE TECHNOLOGY AND PRACTICE FOR INFRASTRUCTURE AND COMMUNITY RESILIENCE, 2017, 1892