Magnetic Anisotropy of Permalloy Films Prepared by Oblique Angle Magnetron Sputtering

被引：0

作者：

Svalov, A. V. ^{[1
]}

Makarochkin, I. A. ^{[1
]}

Pasynkova, A. A. ^{[1
,2
]}

Feshchenko, A. A. ^{[1
]}

Kudyukov, E. V. ^{[1
]}

Lepalovskii, V. N. ^{[1
]}

Kurlyandskaya, G. V. ^{[1
]}

机构：

[1] Ural Fed Univ, Ekaterinburg 620002, Russia

[2] Russian Acad Sci, Mikheev Inst Met Phys, Ural Branch, Ekaterinburg 620108, Russia

来源：

PHYSICS OF METALS AND METALLOGRAPHY | 2022年 / 123卷 / 11期

基金：

俄罗斯科学基金会;

关键词：

permalloy films; magnetron sputtering; oblique angle deposition; induced magnetic anisotropy; domain structure; magnetization reversal process; ORIGIN; CO;

D O I：

10.1134/S0031918X22601044

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

The peculiarities of induced magnetic anisotropy and magnetization reversal processes of single-layer and 10 to 200-nm-thick multilayer Fe20Ni80 films, which were prepared by oblique angle deposition, have been studied. In-plane uniaxial magnetic anisotropy has been found for all single-layer films. Upon deposition of multilayer films, the substrate holder was rotated by 90 degrees before the deposition of each of the subsequent layers. The axis of the resulting magnetic anisotropy was found to make an angle of 45 degrees with the magnetic anisotropy axes of individual layers. The magnetization reversal processes in the samples are considered taking into account both the coherent magnetic moment rotation and the nucleation of reverse magnetization domains and domain wall motion.

引用

页码：1068 / 1074

页数：7

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