Influence of He-ion irradiation on thin NiMn/FeNi exchange bias films

被引：3
|
作者：
Cantelli, V
Von Borany, J
Grenzer, J
Fassbender, J
Kaltofen, R
Schumann, J
机构：
[1] Rossendorf Inc, Forschungszentrum Rossendorf EV, Inst Ion Beam Phys & Mat Res, D-01314 Dresden, Germany
[2] Leibniz Inst Solid State & Mat Res Dresden, D-01069 Dresden, Germany
来源：
JOURNAL OF APPLIED PHYSICS | 2006年 / 99卷 / 08期
关键词：
D O I：
10.1063/1.2159227
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Using synchrotron x-ray diffraction and reflectivity, we studied the transition from the paramagnetic NiMn phase to the chemically ordered, antiferromagnetic L1(0) phase of NiMn/Fe19Ni81 thin films deposited on a Si/SiO2 substrate as a function of the annealing temperature. The transformation to a dominating L1(0)-ordered NiMn film takes place between 300 and 400 degrees C irrespective of the irradiation. This is also consistent with magnetization reversal measurements of the corresponding permalloy layers. The benefit of the ion irradiation is a reduction of the mosaicity for both the NiMn and the permalloy film, and a smoothening of internal interfaces. (C) 2006 American Institute of Physics.
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页数：3
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