Contact optical nanolithography using nanoscale C-shaped apertures

被引：37
|
作者：
Wang, Liang [1 ]
Jin, Eric X. [1 ]
Uppuluri, Sreemanth M. [1 ]
Xu, Xianfan [1 ]
机构：
[1] Purdue Univ, Sch Mech Engn, W Lafayette, IN 47907 USA
来源：
OPTICS EXPRESS | 2006年 / 14卷 / 21期
关键词：
D O I：
10.1364/OE.14.009902
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
C-shaped ridge apertures are used in contact nanolithography to achieve nanometer scale resolution. Lithography results demonstrated that holes as small as 60 nm can be produced in the photoresist by illuminating the apertures with a 355 nm laser beam. Experiments are also performed using comparable square and rectangular apertures. Results show enhanced transmission and light concentration of C apertures compared to the apertures with regular shapes. Finite difference time domain simulations are used to design the apertures and explain the experimental results. (c) 2006 Optical Society of America.
引用
收藏
页码：9902 / 9908
页数：7
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