Influence of experimental parameters on reactive magnetron sputtering CNx thin films

被引：0
|
作者：
Zheng, WT
Ding, T
Ivanov, I
Sundgren, JE
机构：
[1] JILIN UNIV,DEPT MAT SCI,CHANGCHUN 130023,PEOPLES R CHINA
[2] LINKOPING UNIV,DEPT PHYS,S-58183 LINKOPING,SWEDEN
来源：
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY | 1997年 / 13卷 / 02期
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Carbon nitride thin films were deposited on Si(001) using unbalanced magnetron sputtering at different experimental parameters. The effects of nitrogen partial pressure, substrate temperature and substrate bias on the deposition rate and nitrogen content are discussed.
引用
收藏
页码：154 / 156
页数：3
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