Microstructure, Mechanical, and Tribological Properties of CNx Thin Films Prepared by Reactive Magnetron Sputtering

被引：9
|
作者：
Chen, Xiangyang [1 ]
Zhang, Jin [1 ]
Ma, Shengli [2 ]
Hu, Haixia [1 ]
Zhou, Zhebo [1 ]
机构：
[1] Anhui Univ Sci & Technol, Sch Mech Engn, Huainan 232001, Peoples R China
[2] Xi An Jiao Tong Univ, State Key Lab Mech Behav Mat, Xian 710049, Peoples R China
来源：
ACTA METALLURGICA SINICA-ENGLISH LETTERS | 2014年 / 27卷 / 01期
关键词：
Reactive magnetron sputtering (RMS); CNx film; Microstructure; Tribology; CARBON NITRIDE FILMS; AMORPHOUS-CARBON; MULTILAYER FILMS; DEPOSITION;
D O I：
10.1007/s40195-013-0004-4
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
The microstructure, mechanical, and tribological properties of the carbon nitride (CNx) thin films with different nitrogen contents deposited on high-speed steel substrates by reactive magnetron sputtering were studied. CNx films with nitrogen contents from 10.7 to 28.2 at.% had an amorphous structure composing of the carbon bonds of sp(2)C-C, sp(2)C-N, and sp(3)C-N. The TiN inter-layer cause the adhesion of CNx, films enhancement. The more nitrogen concentration led to larger film hardness and friction coefficient against GCr15 steel balls, but the wear rates decreased.
引用
收藏
页码：31 / 36
页数：6
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