Preparation and magnetotransport properties of Ni-Bi and Ni-Cu magnetic multilayers

被引：3
|
作者：
Hutanu, VM [1 ]
Dolocan, V [1 ]
机构：
[1] IOEL SA, Inst Optoelect, Bucharest 76900, Romania
来源：
SIOEL '99: SIXTH SYMPOSIUM ON OPTOELECTRONICS | 2000年 / 4068卷
关键词：
elecrodeposition; thin films; multylayers; magnetoresistance; spectro-elipsometry; Hall resistivity;
D O I：
10.1117/12.378662
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We have investigated the magnetotransport properties of binary metallic systems formed by Ni -Bi and Cu -Ni multilayers. The samples were prepared by electrochemical deposition. Ni-Bi systems were obtained from two separate solutions and Cu-Ni systems from a single electrolyte. The films have been characterized using spectro-ellipsometry. Field dependence of the Hall resistivity and magnetoresistance for both the multilayer deposited structures were measured. Anisotropic magnetoresistance for Cu-Ni structures was found.
引用
收藏
页码：149 / 154
页数：6
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