High resolution flatness measurements on diffuse and scattering surfaces

被引:0
|
作者
Harding, Kevin [1 ]
机构
[1] Opt Metrol Solut, Niskayuna, NY 12309 USA
关键词
metrology; structured light; confocal; additive;
D O I
10.1117/12.2558692
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The use of interferometry for very high accuracy area mapping of the flatness of optical surfaces is a well-known, high-performance tool. However, it is difficult to make a high-performance measurement over a full area of a diffuse or scattering surface such as a machined metal or metal powder used in manufacturing. This challenge is generally addressed with scanning methods using laser lines, confocal or other point scanners of mechanical means such as coordinate measuring machines. Data collection with these method can be very slow, due in part from the flexibility to measure a large change in contour that is not critical to most flatness applications. Previously, we reported on a moire method for diffuse or powder surfaces that is not unlike the Ronchi tests using in process of ground glass. This paper discussed some of the challenges of making this type of measurement and suggests a new hybrid method that trades of the capability for providing profiles over relatively large measurement ranges for obtaining very high sensitivity to errors from the ideal flat surface
引用
收藏
页数:10
相关论文
共 50 条
  • [11] THERMAL DIFFUSE-SCATTERING IN HIGH-RESOLUTION ELECTRON HOLOGRAPHY
    WANG, ZL
    ULTRAMICROSCOPY, 1993, 52 (3-4) : 504 - 511
  • [12] Resolution corrections in diffuse scattering experiments
    Boysen, H.
    Adlhart, W.
    Journal of Applied Crystallography, 1987, 20 (03): : 200 - 209
  • [13] High resolution measurements of surface charge densities on insulator surfaces
    Faircloth, DC
    Allen, NL
    IEEE TRANSACTIONS ON DIELECTRICS AND ELECTRICAL INSULATION, 2003, 10 (02) : 285 - 290
  • [14] High resolution tool for measuring photomask flatness
    Lindquist, D
    Kulawiec, A
    Tronolone, M
    Frankovich, J
    Lee, C
    Lee, S
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY X, 2003, 5130 : 528 - 532
  • [15] Collective Thomson scattering measurements with high frequency resolution at TEXTOR
    Stejner, M.
    Nielsen, S. K.
    Korsholm, S. B.
    Salewski, M.
    Bindslev, H.
    Furtula, V.
    Leipold, F.
    Meo, F.
    Michelsen, P. K.
    Moseev, D.
    Buerger, A.
    Kantor, M.
    de Baar, M.
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2010, 81 (10):
  • [16] HIGH-RESOLUTION X-RAY-SCATTERING MEASUREMENTS
    ZOMBECK, MV
    BRAUNINGER, H
    ONDRUSCH, A
    PREDEHL, P
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1981, 316 : 174 - 186
  • [17] DIFFUSE-SCATTERING OF HIGH-FREQUENCY PHONONS AT SOLID-SURFACES
    NAKAYAMA, T
    PHYSICAL REVIEW B, 1985, 32 (02): : 777 - 780
  • [18] CHARACTERIZATION OF NEARLY PERFECT ALKALI-HALIDE CRYSTALS BY HIGH-RESOLUTION DIFFUSE-X-RAY SCATTERING MEASUREMENTS
    LAL, K
    SINGH, BP
    JOURNAL OF CRYSTAL GROWTH, 1981, 54 (03) : 493 - 500
  • [19] High-resolution characterization of microdefects by X-ray diffuse scattering
    Gronkowski, J
    Borowski, J
    Zielinska-Rohozinska, E
    PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 1999, 357 (1761): : 2721 - 2729
  • [20] NOTES ON RESOLUTION IN SCATTERING MEASUREMENTS
    KUSCH, P
    JOURNAL OF CHEMICAL PHYSICS, 1964, 40 (01): : 1 - &