Carbon nanotube modification using BaF2 vapor in ultra-high vacuum environment

被引:0
|
作者
Santiago, F [1 ]
Gehman, VH [1 ]
Long, K [1 ]
Boulais, KA [1 ]
机构
[1] USN, Ctr Surface Warfare, Dahlgren Div, Electromagnet & Solid State Technol Div, Dahlgren, VA 22448 USA
来源
MICRO- AND NANOSYSTEMS | 2004年 / 782卷
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Carbon nanotubes have attracted significant attention in the scientific community due to their unique properties and potential applications. One of the most promising applications is a carbon-nanotube transistor. The motivation of this work is to find ways to connect carbon nanotubes directly to silicon using Ba as a chemical link. We studied chemical interactions between carbon nanotubes and BaF2 vapors using x-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Surfaces of silicon wafers were chemically modified to allow the epitaxial growth of BaF2 using molecular beam epitaxy (MBE). Samples containing 2D single crystal islands of BaF2 were covered with carbon nanotubes with an average coverage of 10 nanotubes per um(2). The samples were transferred to an outgasing station inside the MBE system and heated to 900degreesC for two hours in a pressure of 10(-9) mbar. XPS C1s data before and after heat show a major change in the nature of the carbon nanotube electronic states. In addition XPS shows formation of a Ba-C "carbide like" bond and no presence of fluorine. AFM images of the same region taken before and after heat exposure show remarkable changes in the surface morphology of the carbon-nanotube wall.
引用
收藏
页码:11 / 15
页数:5
相关论文
共 50 条
  • [1] The fabrication of carbon nanotube probes utilizing ultra-high vacuum transmission electron microscopy
    Chin, Shu-Cheng
    Chang, Yuan-Chih
    Chang, Chia-Seng
    [J]. NANOTECHNOLOGY, 2009, 20 (28)
  • [2] AlGe wafer bonding in ultra-high vacuum environment
    Stoettinger, Thomas
    Rebhan, Bernhard
    Hingerl, Kurt
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2023, 41 (04):
  • [3] Tribological investigations of ionic liquids in ultra-high vacuum environment
    Totolin, Vladimir
    Conte, Marcello
    Berriozabal, Edurne
    Pagano, Francesco
    Minami, Ichiro
    Doerr, Nicole
    Brenner, Josef
    Igartua, Amaya
    [J]. LUBRICATION SCIENCE, 2014, 26 (7-8) : 514 - 524
  • [4] Molecular growth investigation system using fluorescence microscopy in ultra-high vacuum environment
    Yan, Zhidan
    Sun, Lidong
    Hu, Chunguang
    Peter, Zeppenfeld
    [J]. Yi Qi Yi Biao Xue Bao/Chinese Journal of Scientific Instrument, 2013, 34 (09): : 2028 - 2033
  • [5] SiGe Quantum Rings by Ultra-high Vacuum Chemical Vapor Deposition
    Lee, C. -H.
    Lin, C. M.
    Liu, C. W.
    Chang, H. T.
    Lee, S. W.
    Shushpannikov, P.
    Gorodtsov, V. A.
    Goldstein, R. V.
    [J]. SIGE, GE, AND RELATED COMPOUNDS 3: MATERIALS, PROCESSING, AND DEVICES, 2008, 16 (10): : 647 - +
  • [6] Silicon epitaxy using tetrasilane at low temperatures in ultra-high vacuum chemical vapor deposition
    Hazbun, Ramsey
    Hart, John
    Hickey, Ryan
    Ghosh, Ayana
    Fernando, Nalin
    Zollner, Stefan
    Adam, Thomas N.
    Kolodzey, James
    [J]. JOURNAL OF CRYSTAL GROWTH, 2016, 444 : 21 - 27
  • [7] Tetrasilane and digermane for the ultra-high vacuum chemical vapor deposition of SiGe alloys
    Hart, John
    Hazbun, Ramsey
    Eldridge, David
    Hickey, Ryan
    Fernando, Nalin
    Adam, Thomas
    Zollner, Stefan
    Kolodzey, James
    [J]. THIN SOLID FILMS, 2016, 604 : 23 - 27
  • [8] Evaluation of Vapor Pressure and Ultra-High Vacuum Tribological Properties of Ionic Liquids
    Street, Kenneth W., Jr.
    Morales, Wilfredo
    Koch, Victor R.
    Valco, Daniel J.
    Richard, Ryan M.
    Hanks, Nicole
    [J]. TRIBOLOGY TRANSACTIONS, 2011, 54 (06) : 911 - 919
  • [9] Ultra-high coulomb energy in position controlled grown carbon nanotube
    Matsumoto, K
    [J]. 10TH INTERNATIONAL SYMPOSIUM ON NANOSTRUCTURES: PHYSICS AND TECHNOLOGY, 2003, 5023 : 298 - 301
  • [10] The growth of Si1-x-yGexCy alloys with high carbon content by ultra-high vacuum chemical vapor deposition
    Huang, JY
    Ye, ZZ
    Qi, ZL
    Que, D
    [J]. JOURNAL OF MATERIALS SCIENCE LETTERS, 2001, 20 (12) : 1173 - 1175