Role of adhesion in shear strength of nanowire-substrate interfaces

被引:19
|
作者
Manoharan, M. P. [1 ]
Haque, M. A. [1 ]
机构
[1] Penn State Univ, Dept Mech & Nucl Engn, University Pk, PA 16802 USA
基金
美国国家科学基金会;
关键词
OFF FORCE MEASUREMENTS; STATIC FRICTION; MECHANISMS;
D O I
10.1088/0022-3727/42/9/095304
中图分类号
O59 [应用物理学];
学科分类号
摘要
The shear strength of nanowire-substrate contact critically influences the electrical and mechanical contact characteristics of nanowire-based sensors, actuators and nanoelectronic devices. Yet, very few studies are available in the literature because of the experimental challenges associated with these one-dimensional nanostructures and none of the existing contact mechanics models account for their ultra-high bending compliance. Using a novel experimental setup that effectively decouples adhesion and friction forces, we show that the friction coefficient for the zinc oxide nanowires and silicon system can be about two orders of magnitude higher than the bulk values, even under zero externally applied normal loads. We model nanowire bending compliance and capillary line tension as competing mechanisms to explain the observed anomalous adhesion-friction coupling and establish a criterion for contact area dependence in friction in one-dimensional interfaces.
引用
收藏
页数:7
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