Fabrication of 3D Micro and Nanostructures for Photonic Applications

被引：0
|
作者：
Cristea, D. [1 ]
Obreja, P. [1 ]
Dinescu, A. [1 ]
Konstantinidis, G. [2 ]
Rebigan, R. [1 ]
Kusko, C. [1 ]
机构：
[1] Natl Inst R&D Microtechnol Bucharest Voluntari, Bucharest 077190, Romania
[2] FORTH IESL Heraklion, Iraklion, Crete, Greece
来源：
PROCEEDINGS OF THE 7TH INTERNATIONAL CONFERENCE ON MULTI-MATERIAL MICRO MANUFACTURE (4M 2010) | 2011年
关键词：
E-beam lithography; grey scale lithography; replica molding; nanophotonics; ELECTRON-BEAM LITHOGRAPHY;
D O I：
10.3850/978-981-08-6555-9_168
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The paper presents techniques for fabrication of polymeric or metallic 3 D micro nanostructures with application in photonics: antireflective (AR) layers, photonic crystals, plasmonics, and sub-micron diffractive optics. The techniques combine the following processes: 2D and 3D electron beam lithography in a multi-layer resist, metal deposition and lift-off; replica molding. Diffractive optical elements with different shapes (prism, dots, lines) with feature size in the range 100 nm - 150 mu m were obtained for antireflection coatings for solar cells, microlenses for photodetectors, holograms. Metallic nanostructures on Si or glass for electrodes, plasmonics, or replication of high aspect ratio structures have been obtained using EBL in mono or by-layer resist followed by metal deposition and lift-off.
引用
收藏
页码：263 / 266
页数：4
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