Growth of a-C:H and a-C:H⟨Cu⟩ films produced by magnetron sputtering

被引：14
|
作者：
Zvonareva, TK [1 ]
Ivanov-Omskii, VI [1 ]
Nashchekin, AV [1 ]
Sharonova, LV [1 ]
机构：
[1] Russian Acad Sci, AF Ioffe Physicotech Inst, Politekhnicheskaya Ul 26, St Petersburg 194021, Russia
来源：
SEMICONDUCTORS | 2000年 / 34卷 / 01期
基金：
俄罗斯基础研究基金会;
关键词：
D O I：
10.1134/1.1187962
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
Growth behavior of a-C:H and a-C:H[Cu] films produced by the magnetron sputtering of a composite target consisting of graphite and copper plates in an argon-hydrogen atmosphere was studied by infrared spectroscopy, scanning electron microscopy, and ellipsometry. The introduction of copper into amorphous hydrogenated carbon films was shown to cause no marked changes in the carbon-hydrogen bonds in the matrix. In the a-C:H[Cu] films similar to 2 mu m thick, a thin uniform layer (similar to 1000 Angstrom) was found to adjoin the substrate; closer to the free surface, the layer acquires a columnar texture with columns oriented from the substrate to the surface. The results of ellipsometry measurements were analyzed in terms of a two-layer film model. (C) 2000 MAIK "Nauka/Interperiodica".
引用
收藏
页码：98 / 103
页数：6
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