Growth of a-C:H and a-C:H⟨Cu⟩ films produced by magnetron sputtering

被引：14
|
作者：
Zvonareva, TK [1 ]
Ivanov-Omskii, VI [1 ]
Nashchekin, AV [1 ]
Sharonova, LV [1 ]
机构：
[1] Russian Acad Sci, AF Ioffe Physicotech Inst, Politekhnicheskaya Ul 26, St Petersburg 194021, Russia
来源：
SEMICONDUCTORS | 2000年 / 34卷 / 01期
基金：
俄罗斯基础研究基金会;
关键词：
D O I：
10.1134/1.1187962
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
Growth behavior of a-C:H and a-C:H[Cu] films produced by the magnetron sputtering of a composite target consisting of graphite and copper plates in an argon-hydrogen atmosphere was studied by infrared spectroscopy, scanning electron microscopy, and ellipsometry. The introduction of copper into amorphous hydrogenated carbon films was shown to cause no marked changes in the carbon-hydrogen bonds in the matrix. In the a-C:H[Cu] films similar to 2 mu m thick, a thin uniform layer (similar to 1000 Angstrom) was found to adjoin the substrate; closer to the free surface, the layer acquires a columnar texture with columns oriented from the substrate to the surface. The results of ellipsometry measurements were analyzed in terms of a two-layer film model. (C) 2000 MAIK "Nauka/Interperiodica".
引用
收藏
页码：98 / 103
页数：6
相关论文
共 50 条
  • [1] Growth of a-C:H and a-C:H〈Cu〉 films produced by magnetron sputtering
    T. K. Zvonareva
    V. I. Ivanov-Omskii
    A. V. Nashchekin
    L. V. Sharonova
    [J]. Semiconductors, 2000, 34 : 98 - 103
  • [2] Scanning tunneling spectroscopy of a-C:H and a-C:(H, Cu) films prepared by magnetron sputtering
    Zvonareva, TK
    Ivanov-Omskii, VI
    Rozanov, VV
    Sharonova, LV
    [J]. SEMICONDUCTORS, 2001, 35 (12) : 1398 - 1403
  • [3] Scanning tunneling spectroscopy of a-C:H and a-C:(H, Cu) films prepared by magnetron sputtering
    T. K. Zvonareva
    V. I. Ivanov-Omskii
    V. V. Rozanov
    L. V. Sharonova
    [J]. Semiconductors, 2001, 35 : 1398 - 1403
  • [4] Hardness, intrinsic stress, and structure of the a-C and a-C:H films prepared by magnetron sputtering
    Kulikovsky, V
    Bohac, P
    Franc, F
    Deineka, A
    Vorlicek, V
    Jastrabik, L
    [J]. DIAMOND AND RELATED MATERIALS, 2001, 10 (3-7) : 1076 - 1081
  • [5] Preparation and characterisation of a-C and a-C:H coatings deposited by pulsed magnetron sputtering
    Czyzniewski, Andrzej
    [J]. SURFACE & COATINGS TECHNOLOGY, 2009, 203 (08): : 1027 - 1033
  • [6] Elemental composition and electrical properties of (a-C:H):Cu films prepared by magnetron sputtering
    T. K. Zvonareva
    V. M. Lebedev
    T. A. Polyanskaya
    L. V. Sharonova
    V. I. Ivanov-Omskii
    [J]. Semiconductors, 2000, 34 : 1094 - 1099
  • [7] A-C(:H) and a-CNx(:H) films deposited by magnetron sputtering and PACVD
    Nobili, L
    Cavallotti, PL
    Lecis, GC
    De Ponti, G
    Lenardi, C
    [J]. THIN SOLID FILMS, 1998, 317 (1-2) : 359 - 362
  • [8] Elemental composition and electrical properties of (a-C:H):Cu films prepared by magnetron sputtering
    Zvonareva, TK
    Lebedev, VM
    Polyanskaya, TA
    Sharonova, LV
    Ivanov-Omskii, VI
    [J]. SEMICONDUCTORS, 2000, 34 (09) : 1094 - 1099
  • [9] Ion irradiation effects on a-C:H, a-C:N:H and a-C:F:H films
    Galvao, J. R.
    Luce, F. P.
    Baptista, D. L.
    Maia da Costa, M. E. M.
    Lepienski, C. M.
    Zawislak, F. C.
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2006, 249 : 409 - 413
  • [10] Effect of methane on magnetron sputtering graphite target deposited films and tribological properties of a-C:H:Ti/a-C:H friction pairs
    Wen, Xinyu
    Lai, Zhenguo
    Zhang, Bin
    Wang, Xin
    Wang, Yuan Yuan
    Gao, Kaixiong
    Tao, Caihong
    [J]. SURFACE AND INTERFACE ANALYSIS, 2022, 54 (09) : 933 - 943
12345