Optical emission spectroscopy for diagnosis of diamond growth and etching processes in microwave plasma

被引:1
|
作者
Yurov, V. Yu. [1 ,2 ]
Bushuev, E. V. [1 ]
Bolshakov, A. P. [1 ,2 ,3 ]
Antonova, I. A. [1 ,2 ]
Ralchenko, V. G. [1 ,2 ,3 ]
Konov, V. I. [1 ,2 ]
机构
[1] RAS, Gen Phys Inst, Moscow 119991, Russia
[2] Natl Res Nucl Univ MEPhI, Moscow 115409, Russia
[3] Harbin Inst Technol, Harbin 150001, Heilongjiang, Peoples R China
基金
俄罗斯科学基金会;
关键词
SINGLE-CRYSTAL DIAMOND; TEMPERATURE; DEPOSITION; DENSITY;
D O I
10.1051/epjconf/201714902013
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页数:2
相关论文
共 50 条
  • [1] Diamond films and particles growth in hydrogen microwave plasma with graphite solid precursor: Optical emission spectroscopy study
    Yao, Kaili
    Dai, Bing
    Ralchenko, Victor
    Shu, Guoyang
    Zhao, Jiwen
    Liu, Kang
    Yang, Zhenhuai
    Yang, Lei
    Han, Jiecai
    Zhu, Jiaqi
    DIAMOND AND RELATED MATERIALS, 2018, 82 : 33 - 40
  • [2] Investigation of Microwave Plasma during Diamond Doping by Phosphorus Using Optical Emission Spectroscopy
    Lobaev, Mikhail Aleksandrovich
    Radishev, Dmitry Borisovich
    Gorbachev, Alexey Mikhailovich
    Vikharev, Anatoly Leontievich
    Drozdov, Mikhail Nikolaevich
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2019, 216 (21):
  • [3] Optical emission spectroscopy of the plasma during CVD diamond growth with nitrogen addition
    Vandevelde, T
    Nesladek, M
    Quaeyhaegens, C
    Stals, L
    THIN SOLID FILMS, 1996, 290 : 143 - 147
  • [4] Optical emission spectroscopy of the plasma during CVD diamond growth with nitrogen addition
    Vandevelde, T.
    Nesladek, M.
    Quaeyhaegens, C.
    Stals, L.
    1996, (290-291)
  • [5] Plasma Etching Process Monitoring with Optical Emission Spectroscopy
    Wang Wei
    Bi Junjie
    Zhao Junpeng
    2009 INTERNATIONAL CONFERENCE ON INDUSTRIAL MECHATRONICS AND AUTOMATION, 2009, : 45 - 47
  • [6] Optical emission diagnostics and film growth during microwave-plasma-assisted diamond CVD
    Lang, T
    Stiegler, J
    vonKaenel, Y
    Blank, E
    DIAMOND AND RELATED MATERIALS, 1996, 5 (10) : 1171 - 1184
  • [7] Optical emission diagnostics and film growth during microwave-plasma-assisted diamond CVD
    Lang, T.
    Stiegler, J.
    Von, Kaenel, Y.
    Blank, E.
    1996, Elsevier Ltd (05)
  • [8] Diagnosis of microwave plasma CVD for diamond growth by plasma impedance measurement
    Sugahara, K
    Miyake, H
    Maki, T
    Kobayashi, T
    DIAMOND FILMS AND TECHNOLOGY, 1998, 8 (01): : 9 - 17
  • [9] Microwave plasma-assisted etching of diamond
    Tran, D. T.
    Grotjohn, T. A.
    Reinhard, D. K.
    Asmussen, J.
    DIAMOND AND RELATED MATERIALS, 2008, 17 (4-5) : 717 - 721