Thin film microelectronics materials production in the vacuum of space

被引:0
|
作者
Ignatiev, A
Sterling, M
Horton, C
Freundlich, A
Pei, S
Hill, R
机构
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D O I
10.1063/1.52066
中图分类号
V [航空、航天];
学科分类号
08 ; 0825 ;
摘要
The international Space Station era will open up a new dimension in the use of one of the unique attributes of space, vacuum, for the production of advanced semiconductor materials and devices for microelectronics applications. Ultra-vacuum is required for the fabrication in thin film form of high quality semiconductors. This can be accomplished behind a free flying platform similar to the current Wake Shield Facility which is specifically designed to support in-space production. The platform will require apparatus for thin film growth, a robotics interface to allow for the change out of raw materials and the harvesting of finished product, and a servicing plant incorporating Space Station that will support long-term utilization of the platform.
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页码:685 / 689
页数:5
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