Structure and electrical properties of sputtered lithium cobaltite thin films

被引：9
|
作者：
Rao, KJ
Benqlilou-Moudden, H
Couturier, G
Vinatier, R
Levasseur, A
机构：
[1] Inst Chim Mat Condensee Bordeaux, CNRS, F-33607 Pessac, France
[2] Ecole Natl Super Chim & Phys Bordeaux, F-33607 Pessac, France
[3] Ctr Phys Mol Opt & Hertzienne, URA CNRS 283, F-33402 Talence, France
[4] Indian Inst Sci, Solid State & Struct Chem Unit, Bangalore 560012, Karnataka, India
来源：
MATERIALS RESEARCH BULLETIN | 2002年 / 37卷 / 07期
关键词：
X-ray diffraction; electrical properties; microstructure;
D O I：
10.1016/S0025-5408(02)00756-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
LixCoOy films with x < 1 and y > 2 have been prepared by radio-frequency (rf) sputtering from high temperature (HT) LiCoO2 targets. Their structures have been examined with high resolution electron microscopy. Conductivities have been studied between 77 and 400 K. The electrochemical behaviour of film electrodes have been investigated with Li/LiClO4-PC/LixCoOy cells. The annealed films consist of nanocrystalline domains with amorphous boundaries. Electrical conductivities appear to arise from variable-range hopping (VRH) of holes. The films form good electrodes with operating potentials between 2.7 and 3.8 V. The observations have been discussed on the basis of a tentative and heuristic molecular orbital based energy band diagram. (C) 2002 Published by Elsevier Science Ltd.
引用
收藏
页码：1353 / 1367
页数：15
相关论文
共 50 条
  • [41] Optical and electrical properties of RF magnetron sputtered ZnO:Al thin films
    Dimova-Malinovska, D
    Tzenov, N
    Tzolov, M
    Vassilev, L
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1998, 52 (01): : 59 - 62
  • [42] Structural and electrical properties of sputtered indium-zinc oxide thin films
    Ku, D. Y.
    Kim, I. H.
    Lee, I.
    Lee, K. S.
    Lee, T. S.
    Jeon, J. -h.
    Cheong, B.
    Baik, Y. -J.
    Kim, W. M.
    THIN SOLID FILMS, 2006, 515 (04) : 1364 - 1369
  • [43] Surface and electrical properties of plasma processed RF sputtered GaN thin films
    Shanmugan, Subramani
    Mutharasu, Devarajan
    Lee, Zhi Yin
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2014, 68 (03):
  • [44] ELECTRICAL-PROPERTIES OF SPUTTERED MNO2 THIN-FILMS
    FAU, P
    BONINO, JP
    ROUSSET, A
    APPLIED SURFACE SCIENCE, 1994, 78 (02) : 203 - 210
  • [45] Structural, optical and electrical properties of sputtered NiO thin films for gas detection
    Predanocy, M.
    Hotovy, I.
    Caplovicova, M.
    APPLIED SURFACE SCIENCE, 2017, 395 : 208 - 213
  • [46] Influence of Substrate Biasing on the Structural and Electrical Properties of Sputtered Zirconia Thin Films
    Rebib, Farida
    Bousquet, Angelique
    Tomasella, Eric
    Micheli, Victor
    Gottardi, Gloria
    Laidani, Nadhira
    PLASMA PROCESSES AND POLYMERS, 2009, 6 : S830 - S833
  • [47] ELECTRICAL AND OPTICAL-PROPERTIES OF BIAS SPUTTERED ZNO THIN-FILMS
    CAPORALETTI, O
    SOLAR ENERGY MATERIALS, 1982, 7 (01): : 65 - 73
  • [48] Morphological, electrical and optical properties of sputtered Mo thin films on flexible substrates
    Bollero, A.
    Andres, M.
    Garcia, C.
    de Abajo, J.
    Gutierrez, T.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2009, 206 (03): : 540 - 546
  • [49] Effect of the substrate on the structural and electrical properties of dc sputtered Ni thin films
    Ghebouli, B
    Layadi, A
    Kerkache, L
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 1998, 3 (01): : 35 - 39
  • [50] STRUCTURE AND ELECTRICAL-PROPERTIES OF AMORPHOUS PBTIO3 THIN-FILMS SPUTTERED ON COOLED SUBSTRATES
    KITABATAKE, M
    MITSUYU, T
    WASA, K
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1982, 53 (1-2) : 1 - 10
12345