Photopatternable metallopolymers: Photo-cross-linking and photolithography of polyferrocenylsilane methacrylates

被引：28
|
作者：
Cyr, PW [1 ]
Rider, DA [1 ]
Kulbaba, K [1 ]
Manners, I [1 ]
机构：
[1] Univ Toronto, Dept Chem, Toronto, ON M5S 3H6, Canada
来源：
MACROMOLECULES | 2004年 / 37卷 / 11期
关键词：
D O I：
10.1021/ma035895p
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
The synthesis, photopatterning and photo-cross-linking of a metal containing polymer, a polyferrocenylsilane (PFS) with methacrylate side groups were discussed. The methacrylate content in photo-cross-linkable PFS was controlled by derivatization of homopolymers 3 with HEMA reaction. The exposure of toluene solution of methacrylate substituted PFS with Ca 5 mol % of photoinitiator 2,2 dimethoxy-2 phenylacetophenone with direct sun light resulted in the precipitate formation of gel particles. The photopatterning was also analyzed using a shadow mask in which the micron size line of photo cross linked PFS networks were observed.
引用
收藏
页码：3959 / 3961
页数：3
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