Photopatternable metallopolymers: Photo-cross-linking and photolithography of polyferrocenylsilane methacrylates

The synthesis, photopatterning and photo-cross-linking of a metal containing polymer, a polyferrocenylsilane (PFS) with methacrylate side groups were discussed. The methacrylate content in photo-cross-linkable PFS was controlled by derivatization of homopolymers 3 with HEMA reaction. The exposure of toluene solution of methacrylate substituted PFS with Ca 5 mol % of photoinitiator 2,2 dimethoxy-2 phenylacetophenone with direct sun light resulted in the precipitate formation of gel particles. The photopatterning was also analyzed using a shadow mask in which the micron size line of photo cross linked PFS networks were observed.