共 50 条
- [31] Ultra-Shallow Junction Formation by Plasma doping and Excimer Laser Annealing ADVANCED GATE STACK, SOURCE/DRAIN, AND CHANNEL ENGINEERING FOR SI-BASED CMOS 5: NEW MATERIALS, PROCESSES, AND EQUIPMENT, 2009, 19 (01): : 87 - +
- [32] Ultra-shallow junction formation in silicon using ion implantation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 112 (1-4): : 177 - 183
- [35] I: Ultra-shallow junction cleaning: Metrology for evaluating dopant loss and substrate erosion ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES VIII, 2008, 134 : 129 - +
- [36] Ultraviolet (UV) Raman Characterization of Ultra-Shallow Ion Implanted Silicon 2014 20TH INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY (IIT 2014), 2014,
- [39] A simulation study of charge transfer doping for ultra-shallow source/drain extensions MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2004, 114 : 367 - 371
- [40] Atomic layer deposited solid sources for doping of high aspect ratio semiconductor structures 2018 18TH INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY (IWJT), 2018, : 75 - 78