Metalorganic molecular beam epitaxy and etching of GaAs and GaSb using trisdimethylaminoarsenic and trisdimethylaminoantimony (vol 145, pg 668, 1994)

被引:1
|
作者
Yamamoto, K [1 ]
Asahi, H [1 ]
Gonda, S [1 ]
机构
[1] OSAKA UNIV,INST SCI & IND RES,IBARAKI,OSAKA 567,JAPAN
关键词
D O I
10.1016/S0022-0248(97)00434-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:227 / 229
页数:3
相关论文
共 50 条
  • [1] METALORGANIC MOLECULAR-BEAM EPITAXY AND ETCHING OF GAAS AND GASB USING TRISDIMETHYLAMINOARSENIC AND TRISDIMETHYLAMINOANTIMONY
    ASAHI, H
    LIU, XF
    INOUE, K
    MARX, D
    ASAMI, K
    MIKI, K
    GONDA, S
    JOURNAL OF CRYSTAL GROWTH, 1994, 145 (1-4) : 668 - 674
  • [2] Etching of GaSb with trisdimethylaminoantimony and triisopropylantimony in a metalorganic molecular beam epitaxy chamber
    Yamamoto, K
    Asahi, H
    Miki, K
    Gonda, S
    JOURNAL OF CRYSTAL GROWTH, 1997, 173 (1-2) : 21 - 26
  • [3] Metalorganic molecular beam epitaxy and etching of AlGaSb using trisdimethylaminoantimony
    Yamamoto, K
    Asahi, H
    Hidaka, K
    Satoh, J
    Gonda, S
    JOURNAL OF CRYSTAL GROWTH, 1998, 186 (1-2) : 33 - 37
  • [4] Metalorganic molecular beam epitaxy growth and etching of GaSb on flat and high-index surfaces using trisdimethylaminoantimony
    Yamamoto, K
    Asahi, H
    Hayashi, T
    Asami, K
    Gonda, S
    JOURNAL OF CRYSTAL GROWTH, 1996, 164 (1-4) : 117 - 121
  • [5] In-situ selective area etching of GaAs in metalorganic molecular beam epitaxy chamber using trisdimethylaminoarsenic
    Hayashi, T
    Asahi, H
    Yamamoto, K
    Hidaka, K
    Gonda, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1996, 35 (07): : 3814 - 3818
  • [6] Low temperature etching of GaAs substrates and improved morphology of GaAs grown by metalorganic molecular beam epitaxy using trisdimethylaminoarsenic and triethylgallium
    Marx, D.
    Asahi, H.
    Liu, X.F.
    Higashiwaki, M.
    Villaflor, A.B.
    Miki, K.
    Yamamoto, K.
    Gonda, S.
    Shimomura, S.
    Hiyamizu, S.
    Journal of Crystal Growth, 1995, 150 (1 -4 pt 1) : 551 - 556
  • [7] LOW-TEMPERATURE ETCHING OF GAAS SUBSTRATES AND IMPROVED MORPHOLOGY OF GAAS GROWN BY METALORGANIC MOLECULAR-BEAM EPITAXY USING TRISDIMETHYLAMINOARSENIC AND TRIETHYLGALLIUM
    MARX, D
    ASAHI, H
    LIU, XF
    HIGASHIWAKI, M
    VILLAFLOR, AB
    MIKI, K
    YAMAMOTO, K
    GONDO, S
    SHIMOMURA, S
    HIYAMIZU, S
    JOURNAL OF CRYSTAL GROWTH, 1995, 150 (1-4) : 551 - 556
  • [8] METALORGANIC MOLECULAR-BEAM EPITAXY GROWTH-CHARACTERISTICS OF GAAS USING TRIETHYLGALLIUM AND TRISDIMETHYLAMINOARSENIC
    LIU, XF
    ASAHI, H
    INOUE, K
    MARX, D
    ASAMI, K
    MIKI, K
    GONDA, S
    JOURNAL OF APPLIED PHYSICS, 1995, 77 (05) : 1952 - 1958
  • [9] ETCHING EFFECT ON METAL-ORGANIC MOLECULAR-BEAM EPITAXY GROWTH OF GASB USING TRIETHYLGALLIUM AND TRISDIMETHYLAMINOANTIMONY
    LIU, XF
    ASAHI, H
    INOUE, K
    MARX, D
    ASAMI, K
    MIKI, K
    GONDA, S
    APPLIED PHYSICS LETTERS, 1994, 65 (08) : 1027 - 1029
  • [10] In-situ selective area etching of GaAs in metallorganic molecular beam epitaxy chamber using trisdimethylaminoarsenic
    Osaka Univ, Osaka, Japan
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 7 (3814-3818):