LPE growth of textured KNbO3 film using SrTiO3 substrate and V2O5 flux

被引：0
|
作者：
Hibino, T. [1 ]
Kakimoto, K. [1 ]
Ohsato, H. [1 ]
机构：
[1] Nagoya Inst Technol, Grad Sch Engn, Dept Mat Sci & Engn, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan
来源：
AICAM 2005 | 2006年 / 11-12卷
关键词：
KNbO3 thin film; LPE; V2O5; flux; SrTiO3; substrate; epitaxial growth;
D O I：
10.4028/www.scientific.net/AMR.11-12.109
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
KNbO3 thin films were grown on (100) and (110) SrTiO3 substrates by liquid phase epitaxy (LPE) technique. The film orientation and surface morphology were characterized by XRD and AFM, respectively. The limited phase diagram of K2O-Nb2O5-V2O5 system was prepared by DTA measurement to investigate the effect of V2O5 flux on the LPE growth of KNbO3 film. The use of V2O5 flux enhanced a film growth rate at lower growth temperature.
引用
收藏
页码：109 / +
页数：2
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