Epitaxial film growth on a decagonal Al72Ni12Co16 quasicrystal

被引:20
|
作者
Shimoda, M
Sato, TJ
Tsai, AP
Guo, JQ
机构
[1] Natl Inst Mat Sci, Nano Fabricat RG, Nanomat Lab, Tsukuba, Ibaraki 3050047, Japan
[2] Japan Sci & Technol Corp, CREST, Kawaguchi, Saitama 3320012, Japan
关键词
X-ray photoelectron spectroscopy; reflection high-energy electron diffraction (RHEED); surface structure; morphology; roughness; and topography; platimun; indium;
D O I
10.1016/S0039-6028(02)01258-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We performed Pt depositions onto the 10-fold surface of a decagonal Al-Ni-Co quasicrystal to investigate the nature of film growth on quasiperiodic surfaces. Although no epitaxial filius were obtained on the clean 10-fold surface, Pt deposition on the In-predeposited Surface and subsequent annealing yielded an epitaxial layer of multiply twinned PtAl2 crystals. As observed in Au depositions onto the same surface, In acted as a surfactant and promoted two-dimensional growth of the overlayer with annealing. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:276 / 280
页数:5
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