Electroluminescence of flip-chip-bonded InP-based HEMTs with 0.1-μm gate

被引:0
|
作者
Shigekawa, N [1 ]
Furuta, T [1 ]
Kodama, S [1 ]
Suemitsu, T [1 ]
Umeda, Y [1 ]
机构
[1] NTT Corp, Syst Elect Labs, Atsugi, Kanagawa 2430198, Japan
来源
关键词
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Measurement of electroluminescence (EL) due to the recombination in the channel is reported for flip-chip-bonded InP-based HEMTs. The features of the spectrum and the drain-bias-voltage dependence of the intensity agree with those obtained in previous works. The EL signal from each of two neighbouring HEMTs separated by 20 mum is clearly resolved in the spatial distribution measurement. Explanation for the large spread of the EL signal along the source-to-drain direction is also given. These results suggest that the present method is applicable for characterisation of both discrete HEMTs and individual devices in actual ICs.
引用
收藏
页码:865 / 870
页数:6
相关论文
共 50 条
  • [1] Optical characterization of impact ionization in flip-chip-bonded InP-based high electron mobility transistors
    Shigekawa, N
    Furuta, T
    Suemitsu, T
    Umeda, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1999, 38 (10): : 5823 - 5828
  • [2] Optical characterization of impact ionization in flip-chip-bonded InP-based high electron mobility transistors
    Shigekawa, Naotem
    Furuta, Tomofumi
    Suemitsu, Tetsuya
    Umeda, Yohtaro
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (10): : 5823 - 5828
  • [3] W-Band active integrated antenna oscillator based on full-wave design methodology and 0.1-μm gate InP-based HEMTs'
    Inafune, Koji
    Sano, Eiichi
    Matsuzaki, Hideaki
    Kosugi, Toshihiko
    Enoki, Takatorno
    IEICE TRANSACTIONS ON ELECTRONICS, 2006, E89C (07): : 954 - 958
  • [4] Excess gate leakage at low voltage in InP-based HEMTs
    Maher, H
    Scavennec, A
    Décobert, J
    Post, G
    2000 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS, CONFERENCE PROCEEDINGS, 2000, : 83 - 86
  • [5] Impact-ionization-induced noise in InGaAs-based 0.1-μm-gate HEMTs
    Shigekawa, N
    Furuta, T
    Suemitsu, T
    Umeda, Y
    PHYSICA B-CONDENSED MATTER, 1999, 272 (1-4) : 562 - 564
  • [6] 100-gbit/s logic IC using 0.1-μm-gate-length InAlAs/InGaAs/InP HEMTs
    Murata, K
    Sano, K
    Kitabayashi, H
    Sugitani, S
    Sugahara, H
    Enoki, T
    INTERNATIONAL ELECTRON DEVICES 2002 MEETING, TECHNICAL DIGEST, 2002, : 937 - 939
  • [7] Gate and recess engineering for ultrahigh-speed InP-based HEMTs
    Suemitsu, T
    Ishii, T
    Ishii, Y
    IEICE TRANSACTIONS ON ELECTRONICS, 2001, E84C (10): : 1283 - 1288
  • [8] Electron irradiation effects on InP-based HEMTs with different gate widths
    Sun, S. X.
    Fu, X. L.
    Wang, L.
    Yi, J. J.
    Yao, R. X.
    Zheng, X. Y.
    Wu, H. T.
    Liv, F.
    Zhong, Y. H.
    Li, Y. X.
    Ding, P.
    Jin, Z.
    JOURNAL OF OVONIC RESEARCH, 2021, 17 (05): : 411 - 420
  • [9] Double-recess structure with an InP passivation layer for 0.1-μm-gate InPHEMTs
    Kitabayashi, H
    Sugitani, S
    Fukai, YK
    Yamane, Y
    Enoki, T
    IEICE TRANSACTIONS ON ELECTRONICS, 2003, E86C (10): : 2000 - 2003
  • [10] Improving threshold-voltage uniformity of 0.1μm InP-based MODFETs with different gate layouts
    Xu, D
    Enoki, T
    Suemitsu, T
    Umeda, Y
    Yamane, Y
    Ishii, Y
    ELECTRONICS LETTERS, 1998, 34 (16) : 1614 - 1615