Spatial Distribution Of Noise Sources In Thick-Film Resistors

被引：0
|
作者：
Kolek, A. [1 ]
Stadler, A. W. [1 ]
Zawislak, Z. [1 ]
机构：
[1] Rzeszow Univ Technol, Dept Elect Fundamentals, PL-35959 Rzeszow, Poland
来源：
NOISE AND FLUCTUATIONS | 2009年 / 1129卷
关键词：
thermally activated kinetics; thick film resistors; low-frequency noise;
D O I：
暂无
中图分类号：
Q6 [生物物理学];
学科分类号：
071011 ;
摘要：
Experiments are reported which show that thick resistive films contain thermally activated noise sources. Their distribution within resistor volume is highly inhomogeneous and increases near resistor terminations. It occurs also that thermally activated sources of noise are highly influenced by the switching process triggered by the changes of microstructure.
引用
收藏
页码：157 / 160
页数：4
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