Quantitative analysis of Si/SiGeC superlattices using atom probe tomography
被引:4
|
作者:
Estivill, Robert
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h-index: 0
机构:
Univ Grenoble Alpes, F-38000 Grenoble, France
CEA Grenoble, LETI, F-38054 Grenoble, France
STMicroelectronics, F-38926 Crolles, France
Univ Rouen, GPM, CNRS, UMR 6634, F-76821 Mont St Aignan, FranceUniv Grenoble Alpes, F-38000 Grenoble, France
Estivill, Robert
[1
,2
,3
,4
]
Grenier, Adeline
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机构:
Univ Grenoble Alpes, F-38000 Grenoble, France
CEA Grenoble, LETI, F-38054 Grenoble, FranceUniv Grenoble Alpes, F-38000 Grenoble, France
Grenier, Adeline
[1
,2
]
Duguay, Sebastien
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h-index: 0
机构:
Univ Rouen, GPM, CNRS, UMR 6634, F-76821 Mont St Aignan, FranceUniv Grenoble Alpes, F-38000 Grenoble, France
Duguay, Sebastien
[4
]
Vurpillot, Franois
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h-index: 0
机构:
Univ Rouen, GPM, CNRS, UMR 6634, F-76821 Mont St Aignan, FranceUniv Grenoble Alpes, F-38000 Grenoble, France
Vurpillot, Franois
[4
]
Terlier, Tanguy
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h-index: 0
机构:
Univ Grenoble Alpes, F-38000 Grenoble, France
CEA Grenoble, LETI, F-38054 Grenoble, France
STMicroelectronics, F-38926 Crolles, FranceUniv Grenoble Alpes, F-38000 Grenoble, France
Terlier, Tanguy
[1
,2
,3
]
Barnes, Jean-Paul
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h-index: 0
机构:
Univ Grenoble Alpes, F-38000 Grenoble, France
CEA Grenoble, LETI, F-38054 Grenoble, France
STMicroelectronics, F-38926 Crolles, FranceUniv Grenoble Alpes, F-38000 Grenoble, France
Barnes, Jean-Paul
[1
,2
,3
]
Hartmann, Jean-Michel
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h-index: 0
机构:
Univ Grenoble Alpes, F-38000 Grenoble, France
CEA Grenoble, LETI, F-38054 Grenoble, France
STMicroelectronics, F-38926 Crolles, FranceUniv Grenoble Alpes, F-38000 Grenoble, France
Hartmann, Jean-Michel
[1
,2
,3
]
Blavette, Didier
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h-index: 0
机构:
Univ Rouen, GPM, CNRS, UMR 6634, F-76821 Mont St Aignan, FranceUniv Grenoble Alpes, F-38000 Grenoble, France
Blavette, Didier
[4
]
机构:
[1] Univ Grenoble Alpes, F-38000 Grenoble, France
[2] CEA Grenoble, LETI, F-38054 Grenoble, France
[3] STMicroelectronics, F-38926 Crolles, France
[4] Univ Rouen, GPM, CNRS, UMR 6634, F-76821 Mont St Aignan, France
Atom Probe;
SiGeC;
Superlattices;
Carbon precipitation;
Local magnification;
CHEMICAL-VAPOR-DEPOSITION;
FIELD EVAPORATED IONS;
THERMAL-STABILITY;
POST-IONIZATION;
ALLOYS;
OVERLAPS;
DEVICES;
SILICON;
LASER;
D O I:
10.1016/j.ultramic.2015.03.014
中图分类号:
TH742 [显微镜];
学科分类号:
摘要:
SiGe and its alloys are used as key materials in innovative electronic devices. The analysis of these materials together with the localisation of dopants and impurities on a very fine scale is of crucial importance for better understanding their electronic properties. The quantification of carbon and germanium in an as-grown Si/SiGeC superlattice has been investigated using Atom Probe Tomography as a function of analysis conditions and sample anneal temperature. The mass spectrum is heavily influenced by the analysis conditions and chemical identification is needed. It was found that quantitative results are obtained using a intermediate electric field. The evaporation of carbon ions shows a strong spatial and temporal correlation. A series of annealed samples have been analysed, presenting an inhomogeneous carbon distribution, appearing in the shape of small clusters. These findings confirm previous results and give a better understanding of the processes occurring in these technologically important materials. (C) 2015 Elsevier B.V. All rights reserved.
机构:
CEA, LETI, F-38054 Grenoble 9, France
STMicroelectronics, F-38926 Crolles, France
Univ Rouen, CNRS, UMR 6634, GPM, F-76821 Mont St Aignan, FranceCEA, LETI, F-38054 Grenoble 9, France