Chemical behavior in diffusion bonding of Si3N4-Ni and Si3N4-superalloy IN-738

被引：7
|
作者：
Chen, YC
Iwamoto, C
Ishida, Y
机构：
[1] Department of Material Science, University of Tokyo, Tokyo
来源：
SCRIPTA MATERIALIA | 1996年 / 35卷 / 06期
关键词：
D O I：
10.1016/1359-6462(96)00161-3
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
[No abstract available]
引用
收藏
页码：675 / 681
页数：7
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