Simulation of equipment design optimization in microelectronics manufacturing

We explore different mathematical formulations, develop an object-oriented simulation environment, and perform a parametric study in the design of a high-yield, low-cost (raw material), and short-cycle-time chemical vapor deposition (CVD) reactor for microelectronic manufacturing. We begin with several possible configurations for the reactor and formulate them into their corresponding numerical optimization problems. We then develop a software architecture for solving the optimization problems by integrating the heat conduction and species transport simulation codes and a modern optimization software into an object-oriented optimization environment. Numerical experiments are performed, reported, and discussed.