Comparative study of Gaussian- and uniform-profile models of the equilibrium electron beam in a free-electron laser

被引:2
|
作者
Zhang, Shi-Chang [1 ,2 ]
Xu, Yong-Gen [1 ]
Wang, Shi-Jian [1 ]
Ji, Yu-Pin [1 ]
Xu, Jing-Yue [1 ]
机构
[1] Xihua Univ, Sch Phys & Chem, Chengdu 610039, Peoples R China
[2] Southwest Jiaotong Univ, Inst Photoelect, Chengdu 610031, Peoples R China
关键词
free-electron laser; equilibrium electron beam; Gaussian-profile model; uniform-profile model; electron-beam field; HELICAL-WIGGLER; ORBITS; FIELD;
D O I
10.1088/1054-660X/24/12/125005
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Based on the conservation of particle number, analytical expressions of the Gaussian-profile density and self-fields of the equilibrium electron beam in a free-electron laser are deduced in terms of the macroscopic design parameters. Compared to the Gaussian-profile model, both the particle distribution and self-fields effect of the equilibrium electrons are overestimated by the uniform-profile model. It is demonstrated by experimental observation that the Gaussian-profile model is more coincident with the actual fact of the equilibrium electron beam than the uniform-profile model.
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页数:5
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