Viscous finger pattern formed in photoresist film during heat treatment

被引：1
|
作者：
Kawai, A [1 ]
Seki, A [1 ]
Endo, H [1 ]
机构：
[1] Nagaoka Univ Technol, Dept Elect Engn, Nagaoka, Niigata 9402188, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2004年 / 17卷 / 01期
关键词：
viscous finger pattern; photoresist film; Saffman-Taylor model; solvent evaporation; surface energy;
D O I：
10.2494/photopolymer.17.103
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
引用
收藏
页码：103 / 104
页数：2
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