Fabrication of micro-aperture surface emitting laser for near field optical data storage

被引：40
|
作者：
Shinada, S
Koyama, F
Nishiyama, N
Arai, M
Goto, K
Iga, K
机构：
[1] Tokyo Inst Technol, Precis & Intelligence Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
[2] Tokai Univ, Shizuoka 4100321, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1999年 / 38卷 / 11B期
关键词：
optical memory; near field optics; semiconductor laser; surface emitting laser;
D O I：
10.1143/JJAP.38.L1327
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We fabricated a micro-aperture vertical cavity surface emitting laser (VCSEL) for use in near field optical data storage. A composite mirror of Au and a 11-pair semiconductor distributed Bragg reflector (DBR) provides a reflectivity of more than 99%. Fabricated VCSEL devices exhibited sub-mil low threshold operation. A micro-aperture with a diameter below 400 nm was introduced in Au film using focused ion beam etching. A localized near field at a 400 nm aperture was observed and the output power from the aperture was estimated to be 10 mu W.
引用
收藏
页码：L1327 / L1329
页数：3
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