Fabrication of nanostencil using size reduction of micro-aperture by additional deposition

被引：0
|
作者：
Lee, J. S. [1 ]
Park, W. B. [1 ]
Park, C. W. [1 ]
Kim, G. M. [1 ]
机构：
[1] Kyungpook Natl Univ, Sch Mech Engn, Taegu 702701, South Korea
来源：
MICROPROCESSES AND NANOTECHNOLOGY 2007, DIGEST OF PAPERS | 2007年
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：190 / 191
页数：2
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