Studies on a magnetron source

被引:0
|
作者
Moehs, DP [1 ]
机构
[1] Fermilab Natl Accelerator Lab, Batavia, IL 60510 USA
关键词
D O I
暂无
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
In working toward a less noisy H-. magnetron source, a new diagnostic tool consisting of a scannable Faraday Cup Array has been developed and installed on the Fermilab H-. ion source test bench. The array consists of 14 identical Faraday cups with I mm diameter entrance holes spaced 6.4 mm apart. H-. beam currents of 50 to 80 mA with a radius of roughly 3 to 4 cm at the collector are routinely produced by the magnetron. Local current density measurements made as a function of acceleration voltage, sample time during the pulse, and background pressure reveal space charge compensation and beam self-focusing. An optical means of measuring simultaneously the local current density and local phase space parameters is also being investigated. These measurements should shed further light on how the current and beam divergence is distributed over the beam cross section.
引用
收藏
页码:115 / 120
页数:6
相关论文
共 50 条
  • [1] Overview of Recent Studies and Design Changes for the FNAL Magnetron Ion Source
    Bollinger, D. S.
    Sosa, A.
    FIFTH INTERNATIONAL SYMPOSIUM ON NEGATIVE IONS, BEAMS AND SOURCES (NIBS 2016), 2017, 1869
  • [2] Magnetron source of accelerated plasma flow
    L. P. Veresov
    O. L. Veresov
    Technical Physics, 2016, 61 : 59 - 67
  • [3] Magnetron Source of Accelerated Plasma Flow
    Veresov, L. P.
    Veresov, O. L.
    TECHNICAL PHYSICS, 2016, 61 (01) : 59 - 67
  • [4] GAS-MAGNETRON ELECTRON SOURCE
    SEMENOV, AP
    MOKHOSOEV, MV
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 1987, 30 (02) : 398 - 401
  • [5] A MAGNETRON SOURCE FOR ION-IMPLANTATION
    REUTHER, H
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1992, 71 (01): : 87 - 91
  • [6] SIMPLE PLANAR MAGNETRON SPUTTERING SOURCE
    RASTOGI, RS
    VANKAR, VD
    CHOPRA, KL
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1987, 58 (08): : 1505 - 1506
  • [7] EMITTANCE MEASUREMENT OF MAGNETRON ION SOURCE
    MARSICANIN, BS
    NUCLEAR INSTRUMENTS & METHODS, 1969, 75 (01): : 106 - +
  • [8] Raman and XPS studies of DLC films prepared by a magnetron sputter-type negative ion source
    Paik, N
    SURFACE & COATINGS TECHNOLOGY, 2005, 200 (07): : 2170 - 2174
  • [9] MAGNETRON ION-SOURCE FOR ANTIMONY IONS
    JOKIC, T
    JOSIMOV, G
    TOSIC, MM
    GONCIC, B
    JURELA, Z
    NUCLEAR INSTRUMENTS & METHODS, 1980, 178 (2-3): : 309 - 310
  • [10] An RF magnetron-type plasma source
    Sugawara, M
    SURFACE & COATINGS TECHNOLOGY, 1999, 116 : 543 - 546