Chemical and Structural Properties of Polyethyleneimine Film Coated on a SiO2 Substrate in Different Concentrations

被引:24
|
作者
Yun, Hyung-Joong [1 ,2 ]
Hong, Hyobong [3 ]
Lee, Jouhahn [2 ]
Choi, Chel-Jong [1 ]
机构
[1] Chonbuk Natl Univ, Semicond Phys Res Ctr, Sch Semicond & Chem Engn, Jeonju 561756, South Korea
[2] Korea Basic Sci Inst, Div Mat Sci, Taejon 305333, South Korea
[3] Elect & Telecommun Res Inst, IT Convergence Technol Res Lab, Taejon 305700, South Korea
关键词
SiO2; polyethyleneimine; angle-resolved X-ray photoelectron spectroscopy; atomic force microscopy; imine group; SURFACE MODIFICATION; MONOLAYERS; SILICON; XPS;
D O I
10.2320/matertrans.M2014013
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Angle-resolved X-ray photoelectron spectroscopy (AR-XPS) and atomic force microscopy (AFM) were employed to investigate the detailed surface bonding structure and morphology of polyethyleneimine (PEI) layers coated on a SiO2 substrate in concentrations of 0.5-10.0 mass%. With an increase in the PEI concentration, the C-N bonds corresponding to the imine group (-NH) became dominant in the PEI layers, implying a characteristic feature to verify the immobilization of PEI on the SiO2 surface. The thickness of PEI layer calculated using AR-XPS gradually increased with increasing PEI concentration up to a maximum 5 mass%, above which it became saturated. AFM results showed that an increase in PEI concentration led to a decrease in the root mean square (RMS) roughness of PEI layers. Such a saturation tendency of PEI thickness combined with the strongly dependence of the surface morphology behavior of PEI layers on the PEI concentration indicated that SiO2 surface was fully covered by monolayer PEI with a smooth surface morphology at PEI concentration in excess of 5 mass%.
引用
收藏
页码:801 / 805
页数:5
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