Impact of Molecular Dipole Moments on Fermi Level Pinning in Thin Films

被引:17
|
作者
Winkler, Stefanie [1 ,2 ]
Frisch, Johannes [1 ,2 ]
Amsalem, Patrick [2 ]
Krause, Stefan [1 ]
Timpel, Melanie [2 ]
Stolte, Matthias [3 ,4 ]
Wuerthner, Frank [3 ,4 ]
Koch, Norbert [1 ,2 ]
机构
[1] Helmholtz Zentrum Berlin Mat & Energie GmbH, D-12489 Berlin, Germany
[2] Humboldt Univ, D-12489 Berlin, Germany
[3] Univ Wurzburg, Inst Organ Chem, D-97074 Wurzburg, Germany
[4] Univ Wurzburg, Ctr Nanosyst Chem, D-97074 Wurzburg, Germany
来源
JOURNAL OF PHYSICAL CHEMISTRY C | 2014年 / 118卷 / 22期
关键词
SOLAR-CELLS; ELECTRONIC-STRUCTURES; OPTICAL-PROPERTIES; MEROCYANINE DYES; ORGANIC-METAL; ALIGNMENT; ORIENTATION; INTERFACES; DESIGN; OXIDES;
D O I
10.1021/jp5021615
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A series of merocyanine dyes with a wide range of molecular dipole moments were deposited on metal oxides covering a wide work function (Phi) range (2.3 to 7.0 eV), and the energy level alignment at these interfaces was studied with photoelectron spectroscopy. We find that a preferential orientation of the merocyanines and their dipoles in the monolayer systematically lowers Phi of the oxides such that Fermi-level (E-F) pinning at the highest occupied molecular level of the merocyanines only occurs for very high Phi oxides (>= 6 eV). Correspondingly, pinning at the electron affinity level can readily be achieved also with moderate oxide Phi, e.g., for indium tin oxide, and electron transfer between the merocyanines to these oxides can proceed readily. Noteworthy, the E-F-pinning behavior and the associated Phi values seem independent of the molecular dipole moment magnitude, most likely due to the self-limiting effect of Phi as soon as the pinning regime is reached.
引用
收藏
页码:11731 / 11737
页数:7
相关论文
共 50 条
  • [11] Impact of edge-barrier pinning in superconducting thin films
    Jones, W. A.
    Barnes, P. N.
    Mullins, M. J.
    Baca, F. J.
    Emergo, R. L. S.
    Wu, J.
    Haugan, T. J.
    Clem, J. R.
    APPLIED PHYSICS LETTERS, 2010, 97 (26)
  • [12] Fermi-level tuning of topological insulator thin films
    Aitani, Masaki
    Sakamoto, Yusuke
    Hirahara, Toru
    Yamada, Manabu
    Miyazaki, Hidetoshi
    Matsunami, Masaharu
    Kimura, Shin-Ichi
    Hasegawa, Shuji
    Japanese Journal of Applied Physics, 2013, 52 (11 PART 1):
  • [13] MEASUREMENTS OF WORK FUNCTION AND FERMI LEVEL IN THIN TELLURIUM FILMS
    JALOCHOWSKI, M
    MIKOLAJCZAK, P
    SUBOTOWICZ, M
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1972, 14 (02): : K135 - K137
  • [14] Fermi-Level Tuning of Topological Insulator Thin Films
    Aitani, Masaki
    Sakamoto, Yusuke
    Hirahara, Toru
    Yamada, Manabu
    Miyazaki, Hidetoshi
    Matsunami, Masaharu
    Kimura, Shin-ichi
    Hasegawa, Shuji
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (11)
  • [15] ANALYSIS OF FERMI-LEVEL POSITION IN THIN POLYSILICON FILMS
    PETKOVIC, DM
    MICROELECTRONICS JOURNAL, 1994, 25 (04) : 287 - 292
  • [16] ON CALCULATION OF MOLECULAR DIPOLE MOMENTS
    GIESSNERPRETTRE, C
    PULLMAN, A
    THEORETICA CHIMICA ACTA, 1968, 11 (02): : 159 - +
  • [17] Adsorption-induced fermi level pinning
    Davydov, S. Yu.
    Troshin, S. V.
    PHYSICS OF THE SOLID STATE, 2008, 50 (03) : 411 - 415
  • [19] Adsorption-induced Fermi level pinning
    S. Yu. Davydov
    S. V. Troshin
    Physics of the Solid State, 2008, 50 : 411 - 415
  • [20] Fermi level pinning in Cs doped CuPc
    Yan, L
    Watkins, NJ
    Tang, CW
    Gao, YL
    SYNTHETIC METALS, 2003, 137 (1-3) : 1037 - 1038