Thickness dependence of optical properties of amorphous indium oxide thin films deposited by reactive evaporation

被引:12
|
作者
Ulutas, K. [1 ]
Deger, D.
Skarlatos, Y.
机构
[1] Istanbul Univ, Dept Phys, TR-34118 Istanbul, Turkey
[2] Bogazici Univ, Dept Phys, TR-80815 Istanbul, Turkey
关键词
D O I
10.1002/pssa.200521321
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The electrical conductivity and absorption coefficient of amorphous indium oxide thin films, thermally evaporated on glass substrates at room temperature, were evaluated. For direct transitions the variation of the optical band gap with thickness was determined and this variation was supposed to appear due to the variation of localized gap states, whereas the variation of conductivity with thickness was supposed to be due to the variation of carrier concentration. We attribute the variation of absorption coefficient with thickness to the variation of optical band gap energy rather than optical interference. (c) 2006 WILEYNCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:2432 / 2437
页数:6
相关论文
共 50 条
  • [41] Dependence of plasmon polaritons on the thickness of indium tin oxide thin films
    Rhodes, C.
    Cerruti, M.
    Efremenko, A.
    Losego, M.
    Aspnes, D.E.
    Maria, J.-P.
    Franzen, S.
    Journal of Applied Physics, 2008, 103 (09):
  • [42] Optical and electrical properties of crystalline indium tin oxide thin film deposited by vacuum evaporation technique
    Md. Mottaleb Hosen
    A. K. M. Atique Ullah
    Md. Mahbubul Haque
    S. M. Abdur Rahim
    K. M. Abdus Sobahan
    M. N. I. Khan
    Optoelectronics Letters, 2019, 15 : 356 - 359
  • [43] Stoichiometry and Properties of Undoped Indium Oxide Films Prepared by Reactive Evaporation
    Kostishko, B. M.
    Orlov, A. M.
    Gonchar, L. I.
    Inorganic Materials, 33 (08):
  • [44] Stoichiometry and properties of undoped indium oxide films prepared by reactive evaporation
    Kostishko, BM
    Orlov, AM
    Gonchar, LI
    INORGANIC MATERIALS, 1997, 33 (08) : 816 - 819
  • [45] Influence of ZnO buffer layer thickness on the electrical and optical properties of indium zinc oxide thin films deposited on PET substrates
    Lee, Chongmu
    Park, Anna
    Cho, Youngjoon
    Park, Minwoo
    Lee, Wan In
    Kim, Hyoun Woo
    CERAMICS INTERNATIONAL, 2008, 34 (04) : 1093 - 1096
  • [46] Thickness Dependence Properties of Vacuum Deposited PbSe thin films
    Arivazhagan, V.
    Parvathi, M. Manonmani
    Rajesh, S.
    SOLID STATE PHYSICS, PTS 1 AND 2, 2012, 1447 : 627 - 628
  • [47] ELECTRICAL AND OPTICAL-PROPERTIES OF INDIUM TIN OXIDE THIN-FILMS DEPOSITED ON UNHEATED SUBSTRATES BY DC REACTIVE SPUTTERING
    KARASAWA, T
    MIYATA, Y
    THIN SOLID FILMS, 1993, 223 (01) : 135 - 139
  • [48] Properties of indium oxide thin films prepared by reactive electron beam evaporation technique for EMI control
    Asbalter, J
    Karunakaran, S
    Subrahmanyam, A
    PROCEEDING OF THE INTERNATIONAL CONFERENCE ON ELECTROMAGNETIC INTERFERENCE AND COMPATIBILITY '99, 1999, : 366 - 371
  • [49] Compositional dependence of optical and electrical properties of indium doped zinc oxide (IZO) thin films deposited by chemical spray pyrolysis
    Dintle, Lawrence K.
    Luhanga, Pearson V. C.
    Moditswe, Charles
    Muiva, Cosmas M.
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2018, 99 : 91 - 97
  • [50] Thickness dependent properties of nickel oxide thin films deposited by dc reactive magnetron sputtering
    Reddy, A. Mallikarjuna
    Reddy, A. Sivasankar
    Reddy, R. Sreedhara
    VACUUM, 2011, 85 (10) : 949 - 954