Deposition of Pt inside fuel cell electrodes using high power impulse magnetron sputtering

被引:16
|
作者
Cuynet, S. [1 ]
Caillard, A. [1 ]
Lecas, T. [1 ]
Bigarre, J. [2 ]
Buvat, P. [2 ]
Brault, P. [1 ]
机构
[1] Univ Orleans, CNRS, GREMI, UMR7344, F-45067 Orleans 2, France
[2] CEA, DAM, F-37260 Monts, France
关键词
magnetron sputtering; fuel cell; HiPIMS; VAPOR-DEPOSITION; ULTRA-LOW;
D O I
10.1088/0022-3727/47/27/272001
中图分类号
O59 [应用物理学];
学科分类号
摘要
The high power impulse magnetron sputtering (HiPIMS) process is used to incorporate catalytic nanoclusters of platinum into microporous carbon. Such a process leads to an enhancement of the Pt species' penetration into the porous medium, as evidenced by Rutherford backscattering spectroscopy analysis. Each sample of catalyzed porous carbon is tested as a cathode of a proton exchange membrane fuel cell (PEMFC). An increase of 80% at 0.65 V of the PEMFC power density for a low catalyst loading of 0.02 mg cm(-2) highlights the use of the HiPIMS process versus the conventional dc magnetron sputtering process.
引用
收藏
页数:5
相关论文
共 50 条
  • [1] High power impulse magnetron sputtering using a rotating cylindrical magnetron
    Leroy, W. P.
    Mahieu, S.
    Depla, D.
    Ehiasarian, A. P.
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2010, 28 (01): : 108 - 111
  • [2] Deposition rates of high power impulse magnetron sputtering: Physics and economics
    Anders, Andre
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2010, 28 (04): : 783 - 790
  • [3] On the film density using high power impulse magnetron sputtering
    Samuelsson, Mattias
    Lundin, Daniel
    Jensen, Jens
    Raadu, Michael A.
    Gudmundsson, Jon Tomas
    Helmersson, Ulf
    [J]. SURFACE & COATINGS TECHNOLOGY, 2010, 205 (02): : 591 - 596
  • [4] Deposition of zinc oxide layers by high-power impulse magnetron sputtering
    Konstantinidis, S.
    Hemberg, A.
    Dauchot, J. P.
    Hecq, M.
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (03): : L19 - L21
  • [5] Superiority of high power impulse magnetron sputtering in niobium films deposition on copper
    Tan, Weiwei
    Li, Bo
    Lu, Xiangyang
    Xiao, Li
    Li, Boting
    Yang, Deyu
    Yang, Yujia
    Ye, Chao
    Xie, Datao
    [J]. MATERIALS RESEARCH EXPRESS, 2019, 6 (02):
  • [6] High power impulse magnetron sputtering discharge
    Gudmundsson, J. T.
    Brenning, N.
    Lundin, D.
    Helmersson, U.
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2012, 30 (03):
  • [7] On reactive high power impulse magnetron sputtering
    Gudmundsson, J. T.
    [J]. PLASMA PHYSICS AND CONTROLLED FUSION, 2016, 58 (01)
  • [8] Deposition of yttria-stabilized zirconia thin films by high power impulse magnetron sputtering and pulsed magnetron sputtering
    Sonderby, Steffen
    Aijaz, Asim
    Helmersson, Ulf
    Sarakinos, Kostas
    Eklund, Per
    [J]. SURFACE & COATINGS TECHNOLOGY, 2014, 240 : 1 - 6
  • [9] Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
    Purandare, Yashodhan P.
    Ehiasarian, Arutiun P.
    Hovsepian, Papken Eh
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2016, 34 (04):
  • [10] Discharge and Deposition Characteristics of High-Power Impulse Magnetron Sputtering Using Various Target Materials
    Zheng, Bocong
    Wu, Zhongzhen
    Cui, Suihan
    Xiao, Shu
    Liu, Liangliang
    Lin, Hai
    Fu, Ricky K. Y.
    Tian, Xiubo
    Pan, Feng
    Chu, Paul K.
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 2019, 47 (01) : 193 - 198