Adhesion of Thin CVD Films on Pulsed Plasma Pre- Treated Polypropylene

被引：15

作者：

Behm, Henrik ^{[1
]}

Bahroun, Karim ^{[1
]}

Bahre, Hendrik ^{[2
]}

Kirchheim, Dennis ^{[1
]}

Mitschker, Felix ^{[3
]}

Bibinov, Nikita ^{[3
]}

Boeke, Marc ^{[2
]}

Dahlmann, Rainer ^{[1
]}

Awakowicz, Peter ^{[3
]}

Hopmann, Christian ^{[1
]}

Winter, Joerg ^{[2
]}

机构：

[1] Rhein Westfal TH Aachen, Inst Plast Proc IKV, D-52062 Aachen, Germany

[2] Ruhr Univ Bochum, Inst Expt Phys 2, D-44801 Bochum, Germany

[3] Ruhr Univ Bochum, Inst Elect Engn & Plasma Technol, D-44801 Bochum, Germany

来源：

PLASMA PROCESSES AND POLYMERS | 2014年 / 11卷 / 05期

关键词：

adhesion; chemical vapor deposition; ion fluence; polypropylene; pre-treatment; CHEMICAL-VAPOR-DEPOSITION; SURFACE; IMPROVEMENT; DISCHARGE; POLYMERS; COATINGS;

D O I：

10.1002/ppap.201300128

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The adhesion of thin CVD films on polyolefins is often critical due to the low surface free energy of the polymers. In this study, injection moulded PP samples are produced and investigated. The samples are treated in very well-characterized pulsed plasmas before a HMDSO-based coating is applied. The resulting bond strength is analyzed using pull-off tests. The fractured interfaces are characterized with XPS. Oxygen and argon plasma pre-treatments of the PP samples result in a bond strength improvement by a factor of about 2. Comparing oxygen and argon pre-treatments at equal ion fluences to the surface, it can be shown that the bond strength between CVD-coating and polymer is similar.

引用

页码：418 / 425

页数：8

共 50 条

[1] Adhesion between plasma-treated polypropylene films and thin aluminum films
Nakamura, Yoshiki
Nakamae, Katsuhiko
Gordon & Breach Science Publ Inc, London, United Kingdom (59): : 1 - 4
[2] Adhesion between plasma-treated polypropylene films and thin aluminum films
Nakamura, Y
Nakamae, K
JOURNAL OF ADHESION, 1996, 59 (1-4): : 75 - 86
[3] Pulsed-DC Discharge for Plasma CVD of Carbon Thin Films
Al Mamun, Md Abdullah
Furuta, Hiroshi
Hatta, Akimitsu
IEEE TRANSACTIONS ON PLASMA SCIENCE, 2019, 47 (01) : 22 - 31
[4] Deposition of amorphous carbon thin films by pulsed RF plasma CVD
Kim, DS
Kang, TW
JOURNAL OF CHEMICAL ENGINEERING OF JAPAN, 2005, 38 (08) : 593 - 599
[5] Model for deposition of thin films in plasma CVD
Hino, T.
Fujita, I.
Yamashina, T.
Ueda, N.
Asami, N.
Nishikawa, M.
Bulletin of the Faculty of Engineering - Hokkaido University, 1993, (166):
[6] Laser driven plasma CVD of thin films
Konov, VI
Prokhorov, AM
Uglov, SA
Bolshakov, AP
Leontiev, IA
Dausinger, F
Hugel, H
Angstenberger, B
Sepold, G
Metev, S
LASERS IN SYNTHESIS, CHARACTERIZATION, AND PROCESSING OF DIAMOND, 1997, 3484 : 2 - 8
[7] SURFACE CHARACTERIZATION AND ADHESION OF PLASMA-TREATED POLYPROPYLENE
NOWAK, S
SCHLAPBACH, L
HAERRI, HP
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1990, 199 : 98 - PMSE
[8] Structural study of device quality silicon germanium thin films deposited by pulsed RF plasma CVD
Chaudhuri, Partha
Bhaduri, Ayana
Bandyopadhyay, Atul
Williamson, D. L.
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2009, 93 (6-7) : 1016 - 1019
[9] Formation of diamond films by pulsed discharge DC plasma CVD
Noda, M
NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY, 2000, 10 (01): : 32 - 32
[10] SELF-ADHESION OF CORONA-TREATED POLYPROPYLENE FILMS
HILD, S
FUHRMANN, J
KUNSTSTOFFE-PLAST EUROPE, 1995, 85 (07): : 914 - &

← 1 2 3 4 5 →