Laser driven plasma CVD of thin films

被引：0

作者：

Konov, VI ^{[1
]}

Prokhorov, AM ^{[1
]}

Uglov, SA ^{[1
]}

Bolshakov, AP ^{[1
]}

Leontiev, IA ^{[1
]}

Dausinger, F ^{[1
]}

Hugel, H ^{[1
]}

Angstenberger, B ^{[1
]}

Sepold, G ^{[1
]}

Metev, S ^{[1
]}

机构：

[1] Moscow Gen Phys Inst, Moscow 117942, Russia

来源：

LASERS IN SYNTHESIS, CHARACTERIZATION, AND PROCESSING OF DIAMOND | 1997年 / 3484卷

关键词：

diamond film; laser deposition; laser plasmatron;

D O I：

暂无

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A novel technique for CVD synthesis of materials, that does not demand a vacuum chamber and provides high deposition rates, have been developed. It is based on CW CO2-laser maintenance of a stationary optical discharge in a gas stream, exhausting over a substrate into the air (laser plasmatron). Nano- and polycrystalline diamond films were deposited on tungsten substrates from atmospheric pressure Xe(Ar):H-2:CH4 gas mixtures at flow rates 2 l/min. 2,5 kW CO2-laser focused beam produced plasma. Deposition area was about 1 cm(2) and growth rates up to 30-50 mu m/hour. Peculiarities and advantages of laser plasmatrons are discussed.

引用

页码：2 / 8

页数：7

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