X-ray absorption near edge structure and X-ray photoelectron spectroscopy studies of chloride in passive oxide films

被引：23
|
作者：
Natishan, PM
Yu, SY
O'Grady, WE
Ramaker, DE
机构：
[1] USN, Res Lab, Washington, DC 20375 USA
[2] George Washington Univ, Dept Chem, Washington, DC 20052 USA
来源：
ELECTROCHIMICA ACTA | 2002年 / 47卷 / 19期
关键词：
pitting corrosion; oxide film; passivity; X-ray absorption near edge structure; X-ray photoelectron spectroscopy;
D O I：
10.1016/S0013-4686(02)00232-3
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
X-ray absorption near edge structure (XANES), utilizing both electron yield and X-ray fluorescence detectors, and X-ray photoelectron spectroscopy (XPS) were used to follow chloride uptake by oxide-covered aluminum in 0.1 M NaCl solutions. The aluminum samples were polarized at selected potentials below (less positive than) the pitting potential. The electron yield XANES and XPS showed multiple peaks. The XPS chloride spectra showed two distinct sets of doublets. One doublet is related to chloride on the surface and the second is related to chloride incorporated in the oxide film. The XANES results also showed two peaks which are attributed to chloride on the surface and in the bulk of the oxide. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：3131 / 3136
页数：6
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