Spectrometry of 0.46 and 13.56 MHz Ar/SF6 inductive plasma discharges

被引:9
|
作者
Tuszewski, M [1 ]
Scarborough, WK [1 ]
White, RR [1 ]
机构
[1] Los Alamos Natl Lab, Los Alamos, NM 87545 USA
关键词
D O I
10.1063/1.1769599
中图分类号
O59 [应用物理学];
学科分类号
摘要
The neutral and positive ion species of two inductively coupled plasma (ICP) discharges, operated with low-pressure argon and sulfur hexafluoride (Ar/SF6) gas mixtures, are studied with optical emission and mass spectrometry. Similar discharges sustained in the two ICPs show significantly different species. The spectra of the 0.46 MHz hemispherical ICP suggest nearly pure Ar/SF6 discharges. The spectra of the 13.56 MHz planar ICP reveal many species containing silicon and oxygen, from etching of the quartz dielectric. Etch rate measurements support these observations. (C) 2004 American Institute of Physics.
引用
收藏
页码:1811 / 1818
页数:8
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