High uniformity collimator for x-ray proximity lithography

An x-ray optic suitable for use in x-ray proximity lithography is described. It employs multiple flat mirror facets arranged at grazing incidence, each of which creates an optically independent channel that covers the entire target. The facets are arranged so that many channels can simultaneously illuminate the target, thereby achieving high flux at the target with high uniformity. Lithographic constraints on local and global divergence at the mask are met by making the optic small and placing it sufficiently distant from the target.