Imaging interferometric microscopy for enhanced resolution

被引：1

作者：

Schwarz, CJ ^{[1
]}

Kutznetsova, Y ^{[1
]}

Brueck, SRJ ^{[1
]}

机构：

[1] Univ New Mexico, Ctr High Technol Mat, Albuquerque, NM 87106 USA

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVI, PTS 1 & 2 | 2002年 / 4689卷

关键词：

imaging interferometry; interferometric imaging; resolution enhancement; microscopy; wafer inspection; field of view; working distance; electronic image processing;

D O I：

10.1117/12.473526

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Using the principle of imaging interferometry we resolve structures with a relatively low NA microscope objective which could not be resolved in the conventional illumination setup. We show experimental results for the cases of 700-and 4000-nm period gratings. We compare these results with theoretical simulations and estimate the maximum resolution potential. Also we evaluate further advantages of our approach, such as field of view and working distance.

引用

页码：802 / 811

页数：10

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