Simulation Study of Single-Event Burnout in GaN MISFET With Schottky Element

被引:18
|
作者
Wang, Ying [1 ]
Fei, Xin-Xing [2 ]
Wu, Xue [3 ]
Li, Xingji [4 ]
Yang, Jianqun [4 ]
Bao, Mengtian [1 ]
Cao, Fei [1 ]
机构
[1] Hangzhou Dianzi Univ, Minist Educ, Key Lab RF Circuits & Syst, Hangzhou 310018, Peoples R China
[2] Harbin Engn Univ, Coll Informat & Commun Engn, Harbin 150001, Peoples R China
[3] Natl Key Lab Analog Integrated Circuits, Chongqing 400060, Peoples R China
[4] Harbin Inst Technol, Natl Key Lab Mat Behav & Evaluat Technol Space En, Harbin 150080, Peoples R China
基金
中国国家自然科学基金;
关键词
Gallium nitride; MISFETs; Radiation effects; HEMTs; MODFETs; Mathematical model; Metals; MISFET; Schottky contact (SC); single-event burnout (SEB); SEB threshold voltage; technology computer aided design (TCAD); DEGRADATION; IRRADIATION; TRANSISTORS; BEHAVIOR; HEMTS;
D O I
10.1109/TED.2020.3027533
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this article, we investigate a new hardened GaN MISFET with an integrated Schottky contact (SC-MISFET). The new device architecture significantly improves the single-event burnout (SEB) characteristics. Compared to the field plate conventional GaN MISFET (FPC-MISFET), the Schottky metal can extract a larger number of holes, which are generated by heavy-ion irradiation. In addition, the number of carriers involved in the impact ionization process is substantially reduced. These features enable the new hardened structure to achieve a better overall SEB characteristic. After heavy-ion irradiation, the SEB threshold voltages of devices with conventional and hardened structures are 520 and 710 V, respectively.
引用
收藏
页码:5466 / 5471
页数:6
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