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Simulation Study of Single-Event Burnout in GaN MISFET With Schottky Element
被引:15
|作者:
Wang, Ying
[1
]
Fei, Xin-Xing
[2
]
Wu, Xue
[3
]
Li, Xingji
[4
]
Yang, Jianqun
[4
]
Bao, Mengtian
[1
]
Cao, Fei
[1
]
机构:
[1] Hangzhou Dianzi Univ, Minist Educ, Key Lab RF Circuits & Syst, Hangzhou 310018, Peoples R China
[2] Harbin Engn Univ, Coll Informat & Commun Engn, Harbin 150001, Peoples R China
[3] Natl Key Lab Analog Integrated Circuits, Chongqing 400060, Peoples R China
[4] Harbin Inst Technol, Natl Key Lab Mat Behav & Evaluat Technol Space En, Harbin 150080, Peoples R China
基金:
中国国家自然科学基金;
关键词:
Gallium nitride;
MISFETs;
Radiation effects;
HEMTs;
MODFETs;
Mathematical model;
Metals;
MISFET;
Schottky contact (SC);
single-event burnout (SEB);
SEB threshold voltage;
technology computer aided design (TCAD);
DEGRADATION;
IRRADIATION;
TRANSISTORS;
BEHAVIOR;
HEMTS;
D O I:
10.1109/TED.2020.3027533
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
In this article, we investigate a new hardened GaN MISFET with an integrated Schottky contact (SC-MISFET). The new device architecture significantly improves the single-event burnout (SEB) characteristics. Compared to the field plate conventional GaN MISFET (FPC-MISFET), the Schottky metal can extract a larger number of holes, which are generated by heavy-ion irradiation. In addition, the number of carriers involved in the impact ionization process is substantially reduced. These features enable the new hardened structure to achieve a better overall SEB characteristic. After heavy-ion irradiation, the SEB threshold voltages of devices with conventional and hardened structures are 520 and 710 V, respectively.
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页码:5466 / 5471
页数:6
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