Surface reactions for area-selective atomic layer deposition and thermal atomic layer etching of metals and dielectrics

被引：0
|
作者：
Parsons, Gregory [1 ]
机构：
[1] North Carolina State Univ, Raleigh, NC USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2018年 / 255卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
71
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页数：1
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