A photoelectron diffraction study of the structure of ultrathin iron films on Cu{100}

被引：15
|
作者：
Theobald, A
Bao, S
Fernandez, V
Schindler, KM
Schaff, O
Fritzsche, V
Bradshaw, AM
Booth, N
Woodruff, DP
机构：
[1] MAX PLANCK GESELL,FRITZ HABER INST,D-14195 BERLIN,GERMANY
[2] UNIV WARWICK,DEPT PHYS,COVENTRY CV4 7AL,W MIDLANDS,ENGLAND
来源：
SURFACE SCIENCE | 1997年 / 385卷 / 01期
基金：
英国工程与自然科学研究理事会;
关键词：
copper; iron; growth; metal-metal interfaces; photoelectron diffraction;
D O I：
10.1016/S0039-6028(97)00212-4
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Using photoelectron diffraction in the scanned energy mode we have investigated the structure of ultrathin iron films on Cu(110). Up to a coverage of at least five monolayer equivalents (5 MLE) the film grows pseudomorphically. A quantitative analysis of the diffraction data at 1 MLE shows that the film has an island structure. The islands which consist of at least two to three layers are characterised by a strong contraction of the outermost Fe-Fe interlayer spacing compared to the bulk. (C) 1997 Elsevier Science B.V.
引用
收藏
页码：107 / 114
页数：8
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