SiN-based platform toward monolithic integration in photonics and electronics

被引:7
|
作者
Xiong, Wenjuan [1 ,2 ]
Wang, Guilei [1 ,2 ,3 ]
Li, Junfeng [1 ]
Zhao, Chao [1 ,2 ]
Wang, Wenwu [1 ]
Radamson, Henry H. [1 ,2 ,3 ,4 ]
机构
[1] Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] Guangdong Greater Bay Area Inst Integrated Circui, Res & Dev Ctr Optoelect Hybrid IC, Guangzhou 510535, Guangdong, Peoples R China
[4] Mid Sweden Univ, Dept Elect Design, Holmgatan 10, S-85170 Sundsvall, Sweden
关键词
MACH-ZEHNDER INTERFEROMETER; WAVE-GUIDES; FLUORESCENCE MICROSCOPY; SILICON PHOTONICS; GRATING COUPLER; LIGHT-EMISSION; GERMANIUM; GE; TECHNOLOGY; GENERATION;
D O I
10.1007/s10854-020-04909-z
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This work presents a review of silicon nitride applications in Si photonics and electronics. As the one of the prominent photonics platform, it owes excellent characteristics in optical communication that is complimentary in performance to the silicon-on-insulator (SOI) photonics. In addition, silicon nitride plays also an important role in realizing germanium laser because of its unique behavior in tuning strain. The induced strain varies from high tensile to compressive stress. The induced strain improves the carrier transport in the channel of nFETs or pFETs. The strain provides also the possibility in adjusting the bandstructure of germanium and converts the germanium from indirect-to-direct band-gap material which is fundamental in obtain germanium laser.
引用
收藏
页码:1 / 18
页数:18
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