Cutting properties of deposited amorphous silicon in ultra-precision machining

被引:0
|
作者
Jelenkovic, Emil, V [1 ]
To, Suet [1 ]
Chen, Ling [2 ]
Xiao, Gaobo [3 ]
Zhao, Zejia [1 ]
Tang, Chak Yin [2 ]
机构
[1] Hong Kong Polytech Univ, Dept Ind & Syst Engn, State Key Lab Ultraprecis Machining Thchnol, Hong Kong, Hong Kong, Peoples R China
[2] Hong Kong Polytech Univ, Dept Ind & Syst Engn, Hong Kong, Hong Kong, Peoples R China
[3] Shanghai Jiao Tong Univ, Sch Mech Engn, Shanghai, Peoples R China
关键词
ultra-precision machining; brittle-ductile cutting mode transition; amorphous silicon; micro machining; UNDEFORMED CHIP THICKNESS; SINGLE-CRYSTAL SILICON; THIN-FILM TRANSISTORS; MECHANICAL-PROPERTIES; BRITTLE MATERIALS; TRANSITION; HARDNESS; MODULUS; REGIME;
D O I
10.1088/1361-6439/aac795
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The widely used amorphous silicon material is often a deposited one. It is mainly applied in the electronic industry and shows to be a promising candidate for optical devices. The mechanical cutting of deposited amorphous silicon has not been reported so far, while ultra-precision machining of such material for optical devices can be superior to a lithographic approach. In this article, for the first time, cutting properties of deposited amorphous silicon are compared with those of single crystal silicon and polycrystalline silicon, using plunge cut experiment. It is found that the critical depth of cut (CDC) and cutting forces for the amorphous silicon are close to those of single crystalline silicon in the easy-to-cut orientation. In comparison to the polycrystalline silicon, amorphous silicon has higher CDC and lower cutting force. This may allow machining of amorphous optical devices on different semiconductors and/or moulds on various materials with enhanced and isotropic CDC, reduced tool wear and simplified cutting control.
引用
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页数:7
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