Rapid and three-dimensional nanoimprint template fabrication technology using focused ion beam lithography

被引：39
|
作者：
Taniguchi, Jun
Koga, Kentaro
Kogo, Yasuo
Miyamoto, Iwao
机构：
[1] Tokyo Univ Sci, Dept Appl Elect, Noda, Chiba 2788510, Japan
[2] Tokyo Univ Sci, Dept Mat Sci & Technol, Noda, Chiba 2788510, Japan
来源：
MICROELECTRONIC ENGINEERING | 2006年 / 83卷 / 4-9期
关键词：
three-dimensional nanoimprint template; focused ion beam lithography; spin-on-glass; PMMA;
D O I：
10.1016/j.mee.2006.01.101
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The characteristics of focused ion beam (FIB) lithography for spin-on-glass (SOG) and PMMA resists were investigated. These resists have high sensitivity around 1 mu C/cm(2) and their depth gradations were obtained by using less than 1 mu C/cm(2). In particular, FIB lithography working with SOG resists can be used for speedy fabrication of three-dimensional (3D) nanoimprint template. Furthermore, this combination of FIB and SOG has the potential for alternative to EB cutting which is the next generation media mastering technique. Using fabricated SOG template, U-V-nanoimprint lithography was carried out and replicated pattern with 59.8 nm gap was obtained. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码：940 / 943
页数：4
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